Applicability of Atmospheric Pressure Plasma Jet (APPJ) Discharge for the Reduction in Graphene Oxide Films and Synthesis of Carbon Nanomaterials
Atmospheric pressure plasma jets (APPJ) are widely used in industry for surface cleaning and chemical modification. In the recent past, they have gained more scientific attention especially in the processing of carbon nanomaterials. In this work, a novel power generation technique was applied to rea...
| Main Authors: | , , , , , , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2021-10-01
|
| Series: | C |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2311-5629/7/4/71 |
| _version_ | 1797506283239112704 |
|---|---|
| author | Sri Hari Bharath Vinoth Kumar Josefa Ibaceta-Jaña Natalia Maticuic Krystian Kowiorski Matthias Zelt Ulrich Gernert Ludwika Lipińska Bernd Szyszka Rutger Schlatmann Uwe Hartmann Ruslan Muydinov |
| author_facet | Sri Hari Bharath Vinoth Kumar Josefa Ibaceta-Jaña Natalia Maticuic Krystian Kowiorski Matthias Zelt Ulrich Gernert Ludwika Lipińska Bernd Szyszka Rutger Schlatmann Uwe Hartmann Ruslan Muydinov |
| author_sort | Sri Hari Bharath Vinoth Kumar |
| collection | DOAJ |
| description | Atmospheric pressure plasma jets (APPJ) are widely used in industry for surface cleaning and chemical modification. In the recent past, they have gained more scientific attention especially in the processing of carbon nanomaterials. In this work, a novel power generation technique was applied to realize the stable discharge in N<sub>2</sub> (10 vol.% H<sub>2</sub>) forming gas in ambient conditions. This APPJ was used to reduce solution-processed graphene oxide (GO) thin films and the result was compared with an established and optimized reduction process in a low–pressure capacitively coupled (CCP) radiofrequency (RF) hydrogen (H<sub>2</sub>) plasma. The reduced GO (rGO) films were investigated by Raman spectroscopy and X-ray photoelectron spectroscopy (XPS). Effective deoxygenation of GO was observed after a quick 2 s treatment by AAPJ. Further deoxygenation at longer exposure times was found to proceed with the expense of GO–structure integrity. By adding acetylene gas into the same APPJ, carbon nanomaterials on various substrates were synthesized. The carbon materials were characterized by Raman spectroscopy, scanning electron microscopy (SEM), and energy-dispersive X-ray (EDX) analyses. Fullerene-like particles and graphitic carbon with short carbon nanotubes were detected on Si and Ag surfaces, respectively. We demonstrate that the APPJ tool has obvious potential for the versatile processing of carbon nanomaterials. |
| first_indexed | 2024-03-10T04:31:26Z |
| format | Article |
| id | doaj.art-0e2a723849a1416781a4a1fe9c610083 |
| institution | Directory Open Access Journal |
| issn | 2311-5629 |
| language | English |
| last_indexed | 2024-03-10T04:31:26Z |
| publishDate | 2021-10-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | C |
| spelling | doaj.art-0e2a723849a1416781a4a1fe9c6100832023-11-23T04:08:15ZengMDPI AGC2311-56292021-10-01747110.3390/c7040071Applicability of Atmospheric Pressure Plasma Jet (APPJ) Discharge for the Reduction in Graphene Oxide Films and Synthesis of Carbon NanomaterialsSri Hari Bharath Vinoth Kumar0Josefa Ibaceta-Jaña1Natalia Maticuic2Krystian Kowiorski3Matthias Zelt4Ulrich Gernert5Ludwika Lipińska6Bernd Szyszka7Rutger Schlatmann8Uwe Hartmann9Ruslan Muydinov10Institute for High-Frequency and Semiconductor-System Technologies, Technische Universität Berlin, Einsteinufer 25, 10587 Berlin, GermanyInstitute for High-Frequency and Semiconductor-System Technologies, Technische Universität Berlin, Einsteinufer 25, 10587 Berlin, GermanyPvcomB, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, Schwarzschildstraße 3, 12489 Berlin, GermanyGraphene and Composites Research Group, Łukasiewicz Research Network—Institute of Microelectronics and Photonics, Aleja Lotników 32/46, 02-668 Warsaw, PolandPvcomB, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, Schwarzschildstraße 3, 12489 Berlin, GermanyZentraleinrichtung Elektronenmikroskopie (ZELMI), Straße des 17. Juni 135, 10623 Berlin, GermanyGraphene and Composites Research Group, Łukasiewicz Research Network—Institute of Microelectronics and Photonics, Aleja Lotników 32/46, 02-668 Warsaw, PolandInstitute for High-Frequency and Semiconductor-System Technologies, Technische Universität Berlin, Einsteinufer 25, 10587 Berlin, GermanyPvcomB, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, Schwarzschildstraße 3, 12489 Berlin, GermanyImpellis GmbH & Co., KG, Am Försterberg 12, 32805 Horn-Bad Meinberg, GermanyInstitute for High-Frequency and Semiconductor-System Technologies, Technische Universität Berlin, Einsteinufer 25, 10587 Berlin, GermanyAtmospheric pressure plasma jets (APPJ) are widely used in industry for surface cleaning and chemical modification. In the recent past, they have gained more scientific attention especially in the processing of carbon nanomaterials. In this work, a novel power generation technique was applied to realize the stable discharge in N<sub>2</sub> (10 vol.% H<sub>2</sub>) forming gas in ambient conditions. This APPJ was used to reduce solution-processed graphene oxide (GO) thin films and the result was compared with an established and optimized reduction process in a low–pressure capacitively coupled (CCP) radiofrequency (RF) hydrogen (H<sub>2</sub>) plasma. The reduced GO (rGO) films were investigated by Raman spectroscopy and X-ray photoelectron spectroscopy (XPS). Effective deoxygenation of GO was observed after a quick 2 s treatment by AAPJ. Further deoxygenation at longer exposure times was found to proceed with the expense of GO–structure integrity. By adding acetylene gas into the same APPJ, carbon nanomaterials on various substrates were synthesized. The carbon materials were characterized by Raman spectroscopy, scanning electron microscopy (SEM), and energy-dispersive X-ray (EDX) analyses. Fullerene-like particles and graphitic carbon with short carbon nanotubes were detected on Si and Ag surfaces, respectively. We demonstrate that the APPJ tool has obvious potential for the versatile processing of carbon nanomaterials.https://www.mdpi.com/2311-5629/7/4/71atmospheric plasmacarbon nanomaterialsgraphene oxideplasma treatment |
| spellingShingle | Sri Hari Bharath Vinoth Kumar Josefa Ibaceta-Jaña Natalia Maticuic Krystian Kowiorski Matthias Zelt Ulrich Gernert Ludwika Lipińska Bernd Szyszka Rutger Schlatmann Uwe Hartmann Ruslan Muydinov Applicability of Atmospheric Pressure Plasma Jet (APPJ) Discharge for the Reduction in Graphene Oxide Films and Synthesis of Carbon Nanomaterials C atmospheric plasma carbon nanomaterials graphene oxide plasma treatment |
| title | Applicability of Atmospheric Pressure Plasma Jet (APPJ) Discharge for the Reduction in Graphene Oxide Films and Synthesis of Carbon Nanomaterials |
| title_full | Applicability of Atmospheric Pressure Plasma Jet (APPJ) Discharge for the Reduction in Graphene Oxide Films and Synthesis of Carbon Nanomaterials |
| title_fullStr | Applicability of Atmospheric Pressure Plasma Jet (APPJ) Discharge for the Reduction in Graphene Oxide Films and Synthesis of Carbon Nanomaterials |
| title_full_unstemmed | Applicability of Atmospheric Pressure Plasma Jet (APPJ) Discharge for the Reduction in Graphene Oxide Films and Synthesis of Carbon Nanomaterials |
| title_short | Applicability of Atmospheric Pressure Plasma Jet (APPJ) Discharge for the Reduction in Graphene Oxide Films and Synthesis of Carbon Nanomaterials |
| title_sort | applicability of atmospheric pressure plasma jet appj discharge for the reduction in graphene oxide films and synthesis of carbon nanomaterials |
| topic | atmospheric plasma carbon nanomaterials graphene oxide plasma treatment |
| url | https://www.mdpi.com/2311-5629/7/4/71 |
| work_keys_str_mv | AT sriharibharathvinothkumar applicabilityofatmosphericpressureplasmajetappjdischargeforthereductioningrapheneoxidefilmsandsynthesisofcarbonnanomaterials AT josefaibacetajana applicabilityofatmosphericpressureplasmajetappjdischargeforthereductioningrapheneoxidefilmsandsynthesisofcarbonnanomaterials AT nataliamaticuic applicabilityofatmosphericpressureplasmajetappjdischargeforthereductioningrapheneoxidefilmsandsynthesisofcarbonnanomaterials AT krystiankowiorski applicabilityofatmosphericpressureplasmajetappjdischargeforthereductioningrapheneoxidefilmsandsynthesisofcarbonnanomaterials AT matthiaszelt applicabilityofatmosphericpressureplasmajetappjdischargeforthereductioningrapheneoxidefilmsandsynthesisofcarbonnanomaterials AT ulrichgernert applicabilityofatmosphericpressureplasmajetappjdischargeforthereductioningrapheneoxidefilmsandsynthesisofcarbonnanomaterials AT ludwikalipinska applicabilityofatmosphericpressureplasmajetappjdischargeforthereductioningrapheneoxidefilmsandsynthesisofcarbonnanomaterials AT berndszyszka applicabilityofatmosphericpressureplasmajetappjdischargeforthereductioningrapheneoxidefilmsandsynthesisofcarbonnanomaterials AT rutgerschlatmann applicabilityofatmosphericpressureplasmajetappjdischargeforthereductioningrapheneoxidefilmsandsynthesisofcarbonnanomaterials AT uwehartmann applicabilityofatmosphericpressureplasmajetappjdischargeforthereductioningrapheneoxidefilmsandsynthesisofcarbonnanomaterials AT ruslanmuydinov applicabilityofatmosphericpressureplasmajetappjdischargeforthereductioningrapheneoxidefilmsandsynthesisofcarbonnanomaterials |