Chlorobenzene Removal Using DBD Coupled with CuO/γ-Al<sub>2</sub>O<sub>3</sub> Catalyst
The removal of chlorobenzene using a dielectric barrier discharge (DBD) reactor coupled with CuO/γ-Al<sub>2</sub>O<sub>3</sub> catalysts was investigated in this paper. The coupling of CuO enhanced the chlorobenzene degradation and complete oxidation ability of the DBD reacto...
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MDPI AG
2021-07-01
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| Series: | Applied Sciences |
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| Online Access: | https://www.mdpi.com/2076-3417/11/14/6433 |
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| author | Xingpeng Jin Guicheng Wang Liping Lian Fan Gao Renxi Zhang Weixuan Zhao Jianyuan Hou Shanping Chen Ruina Zhang |
| author_facet | Xingpeng Jin Guicheng Wang Liping Lian Fan Gao Renxi Zhang Weixuan Zhao Jianyuan Hou Shanping Chen Ruina Zhang |
| author_sort | Xingpeng Jin |
| collection | DOAJ |
| description | The removal of chlorobenzene using a dielectric barrier discharge (DBD) reactor coupled with CuO/γ-Al<sub>2</sub>O<sub>3</sub> catalysts was investigated in this paper. The coupling of CuO enhanced the chlorobenzene degradation and complete oxidation ability of the DBD reactor, especially under low voltage conditions. The characterization of catalyst was carried out to understand the interaction between catalyst and plasma discharge. The effects of flow rate and discharge power on the degradation of chlorobenzene and the interaction between these parameters were analyzed using the response surface model (RSM). The analysis of variance was applied to evaluate the significance of the independent variables and their interactions. The results show that the interactions between flow rate and discharge power are not negligible for the degradation of chlorobenzene. Moreover, based on the analysis of byproducts, 4-chlorophenol was discriminated as the important intermediate of chlorobenzene degradation, and the speculative decomposition mechanism of chlorobenzene is explored. |
| first_indexed | 2024-03-10T09:46:36Z |
| format | Article |
| id | doaj.art-0fdb4f94fde44a4792a33233278532a4 |
| institution | Directory Open Access Journal |
| issn | 2076-3417 |
| language | English |
| last_indexed | 2024-03-10T09:46:36Z |
| publishDate | 2021-07-01 |
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| spelling | doaj.art-0fdb4f94fde44a4792a33233278532a42023-11-22T03:09:38ZengMDPI AGApplied Sciences2076-34172021-07-011114643310.3390/app11146433Chlorobenzene Removal Using DBD Coupled with CuO/γ-Al<sub>2</sub>O<sub>3</sub> CatalystXingpeng Jin0Guicheng Wang1Liping Lian2Fan Gao3Renxi Zhang4Weixuan Zhao5Jianyuan Hou6Shanping Chen7Ruina Zhang8Shanghai Key Laboratory of Atmospheric Particle Pollution and Prevention (LAP3), Institute of Environmental Science, Fudan University, Shanghai 200433, ChinaInstitute of Developmental Biology and Molecular Medicine, School of Life Sciences, Fudan University, 220 Handan Rd., Shanghai 200433, ChinaShanghai Key Laboratory of Atmospheric Particle Pollution and Prevention (LAP3), Institute of Environmental Science, Fudan University, Shanghai 200433, ChinaShanghai Key Laboratory of Atmospheric Particle Pollution and Prevention (LAP3), Institute of Environmental Science, Fudan University, Shanghai 200433, ChinaShanghai Key Laboratory of Atmospheric Particle Pollution and Prevention (LAP3), Institute of Environmental Science, Fudan University, Shanghai 200433, ChinaShanghai Key Laboratory of Atmospheric Particle Pollution and Prevention (LAP3), Institute of Environmental Science, Fudan University, Shanghai 200433, ChinaShanghai Key Laboratory of Atmospheric Particle Pollution and Prevention (LAP3), Institute of Environmental Science, Fudan University, Shanghai 200433, ChinaShanghai Institute for Design & Research on Environmental Engineering, Shanghai 200232, ChinaShanghai Institute for Design & Research on Environmental Engineering, Shanghai 200232, ChinaThe removal of chlorobenzene using a dielectric barrier discharge (DBD) reactor coupled with CuO/γ-Al<sub>2</sub>O<sub>3</sub> catalysts was investigated in this paper. The coupling of CuO enhanced the chlorobenzene degradation and complete oxidation ability of the DBD reactor, especially under low voltage conditions. The characterization of catalyst was carried out to understand the interaction between catalyst and plasma discharge. The effects of flow rate and discharge power on the degradation of chlorobenzene and the interaction between these parameters were analyzed using the response surface model (RSM). The analysis of variance was applied to evaluate the significance of the independent variables and their interactions. The results show that the interactions between flow rate and discharge power are not negligible for the degradation of chlorobenzene. Moreover, based on the analysis of byproducts, 4-chlorophenol was discriminated as the important intermediate of chlorobenzene degradation, and the speculative decomposition mechanism of chlorobenzene is explored.https://www.mdpi.com/2076-3417/11/14/6433plasma catalysisdielectric barrier discharge (DBD)chlorobenzenechlorinated volatile organic compounds (CVOCs) |
| spellingShingle | Xingpeng Jin Guicheng Wang Liping Lian Fan Gao Renxi Zhang Weixuan Zhao Jianyuan Hou Shanping Chen Ruina Zhang Chlorobenzene Removal Using DBD Coupled with CuO/γ-Al<sub>2</sub>O<sub>3</sub> Catalyst Applied Sciences plasma catalysis dielectric barrier discharge (DBD) chlorobenzene chlorinated volatile organic compounds (CVOCs) |
| title | Chlorobenzene Removal Using DBD Coupled with CuO/γ-Al<sub>2</sub>O<sub>3</sub> Catalyst |
| title_full | Chlorobenzene Removal Using DBD Coupled with CuO/γ-Al<sub>2</sub>O<sub>3</sub> Catalyst |
| title_fullStr | Chlorobenzene Removal Using DBD Coupled with CuO/γ-Al<sub>2</sub>O<sub>3</sub> Catalyst |
| title_full_unstemmed | Chlorobenzene Removal Using DBD Coupled with CuO/γ-Al<sub>2</sub>O<sub>3</sub> Catalyst |
| title_short | Chlorobenzene Removal Using DBD Coupled with CuO/γ-Al<sub>2</sub>O<sub>3</sub> Catalyst |
| title_sort | chlorobenzene removal using dbd coupled with cuo γ al sub 2 sub o sub 3 sub catalyst |
| topic | plasma catalysis dielectric barrier discharge (DBD) chlorobenzene chlorinated volatile organic compounds (CVOCs) |
| url | https://www.mdpi.com/2076-3417/11/14/6433 |
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