Photolithographic Mask Fabrication Process Using Cr/Sapphire Carriers
Elaboration of the technology of novel photolithographic masks fabricated on sapphire substrates for UV and DUV application was described. The main technological steps of mask fabrication as Cr metallization deposition, selection of resist for lithography and Cr layer etching were developed and repo...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
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VSB-Technical University of Ostrava
2019-01-01
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| Series: | Advances in Electrical and Electronic Engineering |
| Subjects: | |
| Online Access: | http://advances.utc.sk/index.php/AEEE/article/view/3357 |
| _version_ | 1797826946029060096 |
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| author | Agnieszka Zawadzka Joanna Prazmowska Regina Paszkiewicz |
| author_facet | Agnieszka Zawadzka Joanna Prazmowska Regina Paszkiewicz |
| author_sort | Agnieszka Zawadzka |
| collection | DOAJ |
| description | Elaboration of the technology of novel photolithographic masks fabricated on sapphire substrates for UV and DUV application was described. The main technological steps of mask fabrication as Cr metallization deposition, selection of resist for lithography and Cr layer etching were developed and reported. The etching of Cr films was carried out through resist mask. Detailed study of Cr layer etching process was performed using different solutions such as KMnO4, HCl and ceric ammonium nitrate-based solutions to obtain good-quality structures with the smallest possible undercut of Cr layer and smooth edge. The mask fabrication process was validated by fabrication of test structures of microelectronic device using photolithography technique. |
| first_indexed | 2024-04-09T12:40:25Z |
| format | Article |
| id | doaj.art-0fe8303f3c6e469596a70aff28b701be |
| institution | Directory Open Access Journal |
| issn | 1336-1376 1804-3119 |
| language | English |
| last_indexed | 2024-04-09T12:40:25Z |
| publishDate | 2019-01-01 |
| publisher | VSB-Technical University of Ostrava |
| record_format | Article |
| series | Advances in Electrical and Electronic Engineering |
| spelling | doaj.art-0fe8303f3c6e469596a70aff28b701be2023-05-14T20:50:13ZengVSB-Technical University of OstravaAdvances in Electrical and Electronic Engineering1336-13761804-31192019-01-0117337437810.15598/aeee.v17i3.33571064Photolithographic Mask Fabrication Process Using Cr/Sapphire CarriersAgnieszka Zawadzka0Joanna Prazmowska1Regina Paszkiewicz2Wroclaw University of Science and TechnologyDepartment of Microelectronics and Nanotechnology, Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372 Wroclaw, PolandDepartment of Microelectronics and Nanotechnology, Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372 Wroclaw, PolandElaboration of the technology of novel photolithographic masks fabricated on sapphire substrates for UV and DUV application was described. The main technological steps of mask fabrication as Cr metallization deposition, selection of resist for lithography and Cr layer etching were developed and reported. The etching of Cr films was carried out through resist mask. Detailed study of Cr layer etching process was performed using different solutions such as KMnO4, HCl and ceric ammonium nitrate-based solutions to obtain good-quality structures with the smallest possible undercut of Cr layer and smooth edge. The mask fabrication process was validated by fabrication of test structures of microelectronic device using photolithography technique.http://advances.utc.sk/index.php/AEEE/article/view/3357chromium etchingphotolithography mask fabrication, sapphire substrate. |
| spellingShingle | Agnieszka Zawadzka Joanna Prazmowska Regina Paszkiewicz Photolithographic Mask Fabrication Process Using Cr/Sapphire Carriers Advances in Electrical and Electronic Engineering chromium etching photolithography mask fabrication, sapphire substrate. |
| title | Photolithographic Mask Fabrication Process Using Cr/Sapphire Carriers |
| title_full | Photolithographic Mask Fabrication Process Using Cr/Sapphire Carriers |
| title_fullStr | Photolithographic Mask Fabrication Process Using Cr/Sapphire Carriers |
| title_full_unstemmed | Photolithographic Mask Fabrication Process Using Cr/Sapphire Carriers |
| title_short | Photolithographic Mask Fabrication Process Using Cr/Sapphire Carriers |
| title_sort | photolithographic mask fabrication process using cr sapphire carriers |
| topic | chromium etching photolithography mask fabrication, sapphire substrate. |
| url | http://advances.utc.sk/index.php/AEEE/article/view/3357 |
| work_keys_str_mv | AT agnieszkazawadzka photolithographicmaskfabricationprocessusingcrsapphirecarriers AT joannaprazmowska photolithographicmaskfabricationprocessusingcrsapphirecarriers AT reginapaszkiewicz photolithographicmaskfabricationprocessusingcrsapphirecarriers |