Effects of CF<sub>4</sub> Plasma Treatment on Indium Gallium Oxide and Ti-doped Indium Gallium Oxide Sensing Membranes in Electrolyte–Insulator–Semiconductors

Electrolyte–insulator–semiconductor (EIS) sensors, used in applications such as pH sensing and sodium ion sensing, are the most basic type of ion-sensitive field-effect transistor (ISFET) membranes. Currently, some of the most popular techniques for synthesizing such sensors are chemical vapor depos...

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Main Authors: Chyuan-Haur Kao, Yen-Lin Su, Wei-Jen Liao, Ming-Hsien Li, Wei-Lun Chan, Shang-Che Tsai, Hsiang Chen
Format: Article
Language:English
Published: MDPI AG 2020-09-01
Series:Crystals
Subjects:
Online Access:https://www.mdpi.com/2073-4352/10/9/810
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author Chyuan-Haur Kao
Yen-Lin Su
Wei-Jen Liao
Ming-Hsien Li
Wei-Lun Chan
Shang-Che Tsai
Hsiang Chen
author_facet Chyuan-Haur Kao
Yen-Lin Su
Wei-Jen Liao
Ming-Hsien Li
Wei-Lun Chan
Shang-Che Tsai
Hsiang Chen
author_sort Chyuan-Haur Kao
collection DOAJ
description Electrolyte–insulator–semiconductor (EIS) sensors, used in applications such as pH sensing and sodium ion sensing, are the most basic type of ion-sensitive field-effect transistor (ISFET) membranes. Currently, some of the most popular techniques for synthesizing such sensors are chemical vapor deposition, reactive sputtering and sol-gel deposition. However, there are certain limitations on such techniques, such as reliability concerns and isolation problems. In this research, a novel design of an EIS membrane consisting of an optical material of indium gallium oxide (IGO) was demonstrated. Compared with conventional treatment such as annealing, Ti doping and CF<sub>4</sub> plasma treatment were incorporated in the fabrication of the film. Because of the effective treatment of doping and plasma treatment, the defects were mitigated and the membrane capacitance was boosted. Therefore, the pH sensitivity can be increased up to 60.8 mV/pH. In addition, the hysteresis voltage can be improved down to 2.1 mV, and the drift voltage can be suppressed to as low as 0.23 mV/h. IGO-based membranes are promising for future high-sensitivity and -stability devices integrated with optical applications.
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spelling doaj.art-10604394ca9248688e7acbd29dc2f98f2023-11-20T13:40:43ZengMDPI AGCrystals2073-43522020-09-0110981010.3390/cryst10090810Effects of CF<sub>4</sub> Plasma Treatment on Indium Gallium Oxide and Ti-doped Indium Gallium Oxide Sensing Membranes in Electrolyte–Insulator–SemiconductorsChyuan-Haur Kao0Yen-Lin Su1Wei-Jen Liao2Ming-Hsien Li3Wei-Lun Chan4Shang-Che Tsai5Hsiang Chen6Department of Electronics Engineering, Chang Gung University, Tao Yuan 333, TaiwanDepartment of Electronics Engineering, Chang Gung University, Tao Yuan 333, TaiwanDepartment of Applied Materials and Optoelectronic Engineering, National Chi Nan University, Puli 545, TaiwanDepartment of Applied Materials and Optoelectronic Engineering, National Chi Nan University, Puli 545, TaiwanDepartment of Applied Materials and Optoelectronic Engineering, National Chi Nan University, Puli 545, TaiwanDepartment of Applied Materials and Optoelectronic Engineering, National Chi Nan University, Puli 545, TaiwanDepartment of Applied Materials and Optoelectronic Engineering, National Chi Nan University, Puli 545, TaiwanElectrolyte–insulator–semiconductor (EIS) sensors, used in applications such as pH sensing and sodium ion sensing, are the most basic type of ion-sensitive field-effect transistor (ISFET) membranes. Currently, some of the most popular techniques for synthesizing such sensors are chemical vapor deposition, reactive sputtering and sol-gel deposition. However, there are certain limitations on such techniques, such as reliability concerns and isolation problems. In this research, a novel design of an EIS membrane consisting of an optical material of indium gallium oxide (IGO) was demonstrated. Compared with conventional treatment such as annealing, Ti doping and CF<sub>4</sub> plasma treatment were incorporated in the fabrication of the film. Because of the effective treatment of doping and plasma treatment, the defects were mitigated and the membrane capacitance was boosted. Therefore, the pH sensitivity can be increased up to 60.8 mV/pH. In addition, the hysteresis voltage can be improved down to 2.1 mV, and the drift voltage can be suppressed to as low as 0.23 mV/h. IGO-based membranes are promising for future high-sensitivity and -stability devices integrated with optical applications.https://www.mdpi.com/2073-4352/10/9/810IGOTi dopingmembranesCF<sub>4</sub> plasma treatmentpH sensing biosensors
spellingShingle Chyuan-Haur Kao
Yen-Lin Su
Wei-Jen Liao
Ming-Hsien Li
Wei-Lun Chan
Shang-Che Tsai
Hsiang Chen
Effects of CF<sub>4</sub> Plasma Treatment on Indium Gallium Oxide and Ti-doped Indium Gallium Oxide Sensing Membranes in Electrolyte–Insulator–Semiconductors
Crystals
IGO
Ti doping
membranes
CF<sub>4</sub> plasma treatment
pH sensing biosensors
title Effects of CF<sub>4</sub> Plasma Treatment on Indium Gallium Oxide and Ti-doped Indium Gallium Oxide Sensing Membranes in Electrolyte–Insulator–Semiconductors
title_full Effects of CF<sub>4</sub> Plasma Treatment on Indium Gallium Oxide and Ti-doped Indium Gallium Oxide Sensing Membranes in Electrolyte–Insulator–Semiconductors
title_fullStr Effects of CF<sub>4</sub> Plasma Treatment on Indium Gallium Oxide and Ti-doped Indium Gallium Oxide Sensing Membranes in Electrolyte–Insulator–Semiconductors
title_full_unstemmed Effects of CF<sub>4</sub> Plasma Treatment on Indium Gallium Oxide and Ti-doped Indium Gallium Oxide Sensing Membranes in Electrolyte–Insulator–Semiconductors
title_short Effects of CF<sub>4</sub> Plasma Treatment on Indium Gallium Oxide and Ti-doped Indium Gallium Oxide Sensing Membranes in Electrolyte–Insulator–Semiconductors
title_sort effects of cf sub 4 sub plasma treatment on indium gallium oxide and ti doped indium gallium oxide sensing membranes in electrolyte insulator semiconductors
topic IGO
Ti doping
membranes
CF<sub>4</sub> plasma treatment
pH sensing biosensors
url https://www.mdpi.com/2073-4352/10/9/810
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