Correction to: Wafer-Scale Fabrication of Sub-10 nm TiO2-Ga2O3 n-p Heterojunctions with Efficient Photocatalytic Activity by Atomic Layer Deposition

Correction to: Wafer-Scale Fabrication of Sub-10 nm TiO2-Ga2O3 n-p Heterojunctions with Efficient Photocatalytic Activity by Atomic Layer Deposition

Please be advised that the name of one of the coauthors in the original article [1] has been incorrectly spelled: ‘Ranish M. Ramachandran’ should be ‘Ranjith K. Ramachandran’.

Bibliographic Details
Main Authors: Hongyan Xu, Feng Han, Chengkai Xia, Siyan Wang, Ranjith K. Ramachandran, Christophe Detavernier, Minsong Wei, Liwei Lin, Serge Zhuiykov
Format: Article
Language:English
Published: SpringerOpen 2019-05-01
Series:Nanoscale Research Letters
Online Access:http://link.springer.com/article/10.1186/s11671-019-3028-5

Internet

http://link.springer.com/article/10.1186/s11671-019-3028-5

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