The condition of producing homogeneous nanoscale resistive Ni-Ti films by magnetron sputtering from two sources

The condition of producing homogeneous nanoscale resistive Ni-Ti films by magnetron sputtering from two sources

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The relevance of the work is caused by the necessity to form nanoscale resistive Ni-Ti films with reproducible parameters for being used in measuring devices operating at high temperatures. The main aim of the study is to prove the opportunities, to define the conditions and modes of producing nanos...

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Bibliographic Details
Main Authors: Valery Vasilev, Alexander Khoshev
Format: Article
Language:Russian
Published: Tomsk Polytechnic University 2019-05-01
Series:Известия Томского политехнического университета: Инжиниринг георесурсов
Subjects:
nanoscale film
resistive film
Ni-Ti
magnetron sputtering
reproducibility
sensors
Online Access:http://izvestiya-tpu.ru/archive/article/view/1438

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