Possibility of Benzene Exposure in Workers of a Semiconductor Industry Based on the Patent Resources, 1990–2010
Background: This study aimed to assess the possibility of benzene exposure in workers of a Korean semiconductor manufacturing company by reviewing the issued patents. Methods: A systematic patent search was conducted with the Google “Advanced Patent Search” engine using the keywords “semiconductor”...
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| Format: | Article |
| Language: | English |
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Elsevier
2021-09-01
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| Series: | Safety and Health at Work |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2093791121000111 |
| _version_ | 1827844216637620224 |
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| author | Sangjun Choi Donguk Park Yunkyung Park |
| author_facet | Sangjun Choi Donguk Park Yunkyung Park |
| author_sort | Sangjun Choi |
| collection | DOAJ |
| description | Background: This study aimed to assess the possibility of benzene exposure in workers of a Korean semiconductor manufacturing company by reviewing the issued patents. Methods: A systematic patent search was conducted with the Google “Advanced Patent Search” engine using the keywords “semiconductor” and “benzene” combined with all of the words accessed on January 24, 2016. Results: As a result of the search, we reviewed 75 patent documents filed by a Korean semiconductor manufacturing company from 1994 to 2010. From 22 patents, we found that benzene could have been used as one of the carbon sources in chemical vapor deposition for capacitor; as diamond-like carbon for solar cell, graphene formation, or etching for transition metal thin film; and as a solvent for dielectric film, silicon oxide layer, nanomaterials, photoresist, rise for immersion lithography, electrophotography, and quantum dot ink. Conclusion: Considering the date of patent filing, it is possible that workers in the chemical vapor deposition, immersion lithography, and graphene formation processes could be exposed to benzene from 1996 to 2010. |
| first_indexed | 2024-03-12T08:38:24Z |
| format | Article |
| id | doaj.art-11e1ca5bde89485990e0d3d4341a8449 |
| institution | Directory Open Access Journal |
| issn | 2093-7911 |
| language | English |
| last_indexed | 2024-03-12T08:38:24Z |
| publishDate | 2021-09-01 |
| publisher | Elsevier |
| record_format | Article |
| series | Safety and Health at Work |
| spelling | doaj.art-11e1ca5bde89485990e0d3d4341a84492023-09-02T17:00:57ZengElsevierSafety and Health at Work2093-79112021-09-01123403415Possibility of Benzene Exposure in Workers of a Semiconductor Industry Based on the Patent Resources, 1990–2010Sangjun Choi0Donguk Park1Yunkyung Park2Department of Preventive Medicine, College of Medicine, The Catholic University of Korea, Seoul, 06591, Republic of Korea; Corresponding author. Department of Preventive Medicine, College of Medicine, The Catholic University of Korea, 222 Banpo-daero, Seocho-gu, Seoul, 06591, Republic of Korea.Department of Environmental Health, Korea National Open University, Seoul, 03087, Republic of KoreaDepartment of Occupational Health, Daegu Catholic University, Gyeongbuk, 38430, Republic of KoreaBackground: This study aimed to assess the possibility of benzene exposure in workers of a Korean semiconductor manufacturing company by reviewing the issued patents. Methods: A systematic patent search was conducted with the Google “Advanced Patent Search” engine using the keywords “semiconductor” and “benzene” combined with all of the words accessed on January 24, 2016. Results: As a result of the search, we reviewed 75 patent documents filed by a Korean semiconductor manufacturing company from 1994 to 2010. From 22 patents, we found that benzene could have been used as one of the carbon sources in chemical vapor deposition for capacitor; as diamond-like carbon for solar cell, graphene formation, or etching for transition metal thin film; and as a solvent for dielectric film, silicon oxide layer, nanomaterials, photoresist, rise for immersion lithography, electrophotography, and quantum dot ink. Conclusion: Considering the date of patent filing, it is possible that workers in the chemical vapor deposition, immersion lithography, and graphene formation processes could be exposed to benzene from 1996 to 2010.http://www.sciencedirect.com/science/article/pii/S2093791121000111BenzenePast exposurePatentSemiconductor |
| spellingShingle | Sangjun Choi Donguk Park Yunkyung Park Possibility of Benzene Exposure in Workers of a Semiconductor Industry Based on the Patent Resources, 1990–2010 Safety and Health at Work Benzene Past exposure Patent Semiconductor |
| title | Possibility of Benzene Exposure in Workers of a Semiconductor Industry Based on the Patent Resources, 1990–2010 |
| title_full | Possibility of Benzene Exposure in Workers of a Semiconductor Industry Based on the Patent Resources, 1990–2010 |
| title_fullStr | Possibility of Benzene Exposure in Workers of a Semiconductor Industry Based on the Patent Resources, 1990–2010 |
| title_full_unstemmed | Possibility of Benzene Exposure in Workers of a Semiconductor Industry Based on the Patent Resources, 1990–2010 |
| title_short | Possibility of Benzene Exposure in Workers of a Semiconductor Industry Based on the Patent Resources, 1990–2010 |
| title_sort | possibility of benzene exposure in workers of a semiconductor industry based on the patent resources 1990 2010 |
| topic | Benzene Past exposure Patent Semiconductor |
| url | http://www.sciencedirect.com/science/article/pii/S2093791121000111 |
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