On the relationship between the Raman scattering features and the Ti-related chemical states of TixOyNz films

Owing to its singular and (to some extend) adaptable characteristics, titanium oxynitride (TixOyNz) represents an exceptional choice in the realm of new materials aiming at the development of practical devices. However, the effective use of TixOyNz in photovoltaic and (photo)catalysis applications,...

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Main Authors: A.R. Zanatta, F. Cemin, F.G. Echeverrigaray, F. Alvarez
Format: Article
Language:English
Published: Elsevier 2021-09-01
Series:Journal of Materials Research and Technology
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S2238785421006451
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author A.R. Zanatta
F. Cemin
F.G. Echeverrigaray
F. Alvarez
author_facet A.R. Zanatta
F. Cemin
F.G. Echeverrigaray
F. Alvarez
author_sort A.R. Zanatta
collection DOAJ
description Owing to its singular and (to some extend) adaptable characteristics, titanium oxynitride (TixOyNz) represents an exceptional choice in the realm of new materials aiming at the development of practical devices. However, the effective use of TixOyNz in photovoltaic and (photo)catalysis applications, for example, relies on a refined production−properties balance. Accordingly, this paper reports on the physico-chemical properties of TixOyNz films as investigated by means of the Raman scattering and X-ray photoelectron spectroscopy (XPS) techniques – the former shedding light on the structural characteristics of the films, and the latter providing the state of oxidation of the film's constituents. The films were prepared by sputtering TiO2 and Ti targets in a plasma comprising different mixtures of Ar and N2. Because of the deposition method and conditions, the films exhibit Raman spectra that are consistent with a combination of TiO2 and TiN or, more properly, TixOyNz under the amorphous and (nano/micro-)crystalline structures. In fact, the experimental data indicate the presence of four TiO2- and two TiN-related phonon modes, whose relative scattering features scale with the oxygen and nitrogen contents of the films. A similar concentration dependence was verified with the percentage of Ti4+, Ti3+, and Ti2+ chemical states of oxidation. This mutual concentration dependence was explored thoroughly and the results clearly indicate the suitability of the Raman data to estimate the typical atom composition and distribution of the Ti-related chemical states of TixOyNz.
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spelling doaj.art-15b9fc78fadc4437abe1268ab3873d602022-12-21T21:34:55ZengElsevierJournal of Materials Research and Technology2238-78542021-09-0114864870On the relationship between the Raman scattering features and the Ti-related chemical states of TixOyNz filmsA.R. Zanatta0F. Cemin1F.G. Echeverrigaray2F. Alvarez3Instituto de Física de São Carlos, USP, São Carlos, 13560-970, SP, Brazil; Corresponding author.Instituto de Física Gleb Wataghin, UNICAMP, Campinas, 13083-970, SP, BrazilInstituto de Física Gleb Wataghin, UNICAMP, Campinas, 13083-970, SP, BrazilInstituto de Física Gleb Wataghin, UNICAMP, Campinas, 13083-970, SP, BrazilOwing to its singular and (to some extend) adaptable characteristics, titanium oxynitride (TixOyNz) represents an exceptional choice in the realm of new materials aiming at the development of practical devices. However, the effective use of TixOyNz in photovoltaic and (photo)catalysis applications, for example, relies on a refined production−properties balance. Accordingly, this paper reports on the physico-chemical properties of TixOyNz films as investigated by means of the Raman scattering and X-ray photoelectron spectroscopy (XPS) techniques – the former shedding light on the structural characteristics of the films, and the latter providing the state of oxidation of the film's constituents. The films were prepared by sputtering TiO2 and Ti targets in a plasma comprising different mixtures of Ar and N2. Because of the deposition method and conditions, the films exhibit Raman spectra that are consistent with a combination of TiO2 and TiN or, more properly, TixOyNz under the amorphous and (nano/micro-)crystalline structures. In fact, the experimental data indicate the presence of four TiO2- and two TiN-related phonon modes, whose relative scattering features scale with the oxygen and nitrogen contents of the films. A similar concentration dependence was verified with the percentage of Ti4+, Ti3+, and Ti2+ chemical states of oxidation. This mutual concentration dependence was explored thoroughly and the results clearly indicate the suitability of the Raman data to estimate the typical atom composition and distribution of the Ti-related chemical states of TixOyNz.http://www.sciencedirect.com/science/article/pii/S2238785421006451Titanium oxynitride (TixOyNz)Raman scatteringXPS spectroscopy
spellingShingle A.R. Zanatta
F. Cemin
F.G. Echeverrigaray
F. Alvarez
On the relationship between the Raman scattering features and the Ti-related chemical states of TixOyNz films
Journal of Materials Research and Technology
Titanium oxynitride (TixOyNz)
Raman scattering
XPS spectroscopy
title On the relationship between the Raman scattering features and the Ti-related chemical states of TixOyNz films
title_full On the relationship between the Raman scattering features and the Ti-related chemical states of TixOyNz films
title_fullStr On the relationship between the Raman scattering features and the Ti-related chemical states of TixOyNz films
title_full_unstemmed On the relationship between the Raman scattering features and the Ti-related chemical states of TixOyNz films
title_short On the relationship between the Raman scattering features and the Ti-related chemical states of TixOyNz films
title_sort on the relationship between the raman scattering features and the ti related chemical states of tixoynz films
topic Titanium oxynitride (TixOyNz)
Raman scattering
XPS spectroscopy
url http://www.sciencedirect.com/science/article/pii/S2238785421006451
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