PECVD SiNx passivation with more than 8 MV/cm breakdown strength for GaN-on-Si wafer stress management

In this work, multi-layer PECVD SiNx/SiNx and SiNx/SiOy passivations are developed featuring very high soft breakdown strength and tunable stress properties, which would allow for stress engineering and wafer bow minimization. AlGaN/GaN-on-Si wafers (150 mm) with very low initial bow (<5 μm) are...

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Bibliographic Details
Main Authors: Matthias Moser, Mamta Pradhan, Mohammed Alomari, Michael Heuken, Thomas Schmitt, Ingmar Kallfass, Joachim N. Burghartz
Format: Article
Language:English
Published: Elsevier 2023-03-01
Series:Power Electronic Devices and Components
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S2772370422000293