Morphology Controlled Fabrication of InN Nanowires on Brass Substrates

Growth of semiconductor nanowires on cheap metal substrates could pave the way to the large-scale manufacture of low-cost nanowire-based devices. In this work, we demonstrated that high density InN nanowires can be directly grown on brass substrates by metal-organic chemical vapor deposition. It was...

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Main Authors: Huijie Li, Guijuan Zhao, Lianshan Wang, Zhen Chen, Shaoyan Yang
Format: Article
Language:English
Published: MDPI AG 2016-10-01
Series:Nanomaterials
Subjects:
Online Access:http://www.mdpi.com/2079-4991/6/11/195
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author Huijie Li
Guijuan Zhao
Lianshan Wang
Zhen Chen
Shaoyan Yang
author_facet Huijie Li
Guijuan Zhao
Lianshan Wang
Zhen Chen
Shaoyan Yang
author_sort Huijie Li
collection DOAJ
description Growth of semiconductor nanowires on cheap metal substrates could pave the way to the large-scale manufacture of low-cost nanowire-based devices. In this work, we demonstrated that high density InN nanowires can be directly grown on brass substrates by metal-organic chemical vapor deposition. It was found that Zn from the brass substrates is the key factor in the formation of nanowires by restricting the lateral growth of InN. The nanowire morphology is highly dependent on the growth temperature. While at a lower growth temperature, the nanowires and the In droplets have large diameters. At the elevated growth temperature, the lateral sizes of the nanowires and the In droplets are much smaller. Moreover, the nanowire diameter can be controlled in situ by varying the temperature in the growth process. This method is very instructive to the diameter-controlled growth of nanowires of other materials.
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spelling doaj.art-15f07bbab94442828b36a09331d89fea2022-12-21T18:37:43ZengMDPI AGNanomaterials2079-49912016-10-0161119510.3390/nano6110195nano6110195Morphology Controlled Fabrication of InN Nanowires on Brass SubstratesHuijie Li0Guijuan Zhao1Lianshan Wang2Zhen Chen3Shaoyan Yang4Key Laboratory of Semiconductor Materials Science and Beijing Key Laboratory of Low Dimensional Semiconductor Materials and Devices, Institute of Semiconductors, Chinese Academy of Sciences, P. O. Box 912, Beijing 100083, ChinaKey Laboratory of Semiconductor Materials Science and Beijing Key Laboratory of Low Dimensional Semiconductor Materials and Devices, Institute of Semiconductors, Chinese Academy of Sciences, P. O. Box 912, Beijing 100083, ChinaKey Laboratory of Semiconductor Materials Science and Beijing Key Laboratory of Low Dimensional Semiconductor Materials and Devices, Institute of Semiconductors, Chinese Academy of Sciences, P. O. Box 912, Beijing 100083, ChinaLatticePower (Jiangxi) Corporation, No. 699 North Aixihu Road, National High-Tech Industrial Development Zone, Nanchang 330029, ChinaKey Laboratory of Semiconductor Materials Science and Beijing Key Laboratory of Low Dimensional Semiconductor Materials and Devices, Institute of Semiconductors, Chinese Academy of Sciences, P. O. Box 912, Beijing 100083, ChinaGrowth of semiconductor nanowires on cheap metal substrates could pave the way to the large-scale manufacture of low-cost nanowire-based devices. In this work, we demonstrated that high density InN nanowires can be directly grown on brass substrates by metal-organic chemical vapor deposition. It was found that Zn from the brass substrates is the key factor in the formation of nanowires by restricting the lateral growth of InN. The nanowire morphology is highly dependent on the growth temperature. While at a lower growth temperature, the nanowires and the In droplets have large diameters. At the elevated growth temperature, the lateral sizes of the nanowires and the In droplets are much smaller. Moreover, the nanowire diameter can be controlled in situ by varying the temperature in the growth process. This method is very instructive to the diameter-controlled growth of nanowires of other materials.http://www.mdpi.com/2079-4991/6/11/195III-nitridesnanowiresmetal substratesindium nitridemetal-organic chemical vapor deposition
spellingShingle Huijie Li
Guijuan Zhao
Lianshan Wang
Zhen Chen
Shaoyan Yang
Morphology Controlled Fabrication of InN Nanowires on Brass Substrates
Nanomaterials
III-nitrides
nanowires
metal substrates
indium nitride
metal-organic chemical vapor deposition
title Morphology Controlled Fabrication of InN Nanowires on Brass Substrates
title_full Morphology Controlled Fabrication of InN Nanowires on Brass Substrates
title_fullStr Morphology Controlled Fabrication of InN Nanowires on Brass Substrates
title_full_unstemmed Morphology Controlled Fabrication of InN Nanowires on Brass Substrates
title_short Morphology Controlled Fabrication of InN Nanowires on Brass Substrates
title_sort morphology controlled fabrication of inn nanowires on brass substrates
topic III-nitrides
nanowires
metal substrates
indium nitride
metal-organic chemical vapor deposition
url http://www.mdpi.com/2079-4991/6/11/195
work_keys_str_mv AT huijieli morphologycontrolledfabricationofinnnanowiresonbrasssubstrates
AT guijuanzhao morphologycontrolledfabricationofinnnanowiresonbrasssubstrates
AT lianshanwang morphologycontrolledfabricationofinnnanowiresonbrasssubstrates
AT zhenchen morphologycontrolledfabricationofinnnanowiresonbrasssubstrates
AT shaoyanyang morphologycontrolledfabricationofinnnanowiresonbrasssubstrates