The Technology of Plasma Spray Physical Vapour Deposition
The article presents a new technology of thermal barrier coating deposition called Plasma Spray – Physical Vapour Deposition (PS-PVD). The key feature of the process is the option of evaporating ceramic powder, which enables the deposition of a columnar ceramic coating. The essential properties of t...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
De Gruyter
2013-02-01
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| Series: | High Temperature Materials and Processes |
| Subjects: | |
| Online Access: | https://doi.org/10.1515/htmp-2012-0051 |
| Summary: | The article presents a new technology of thermal barrier coating deposition called Plasma Spray – Physical Vapour Deposition (PS-PVD). The key feature of the process is the option of evaporating ceramic powder, which enables the deposition of a columnar ceramic coating. The essential properties of the PS-PVD process have been outlined, as well as recent literature references. In addition, the influence of a set of process conditions on the properties of the deposited coatings has been described. The new plasma-spraying PS-PVD method is a promising technology for the deposition of modern thermal barrier coatings on aircraft engine turbine blades. |
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| ISSN: | 0334-6455 2191-0324 |