The Technology of Plasma Spray Physical Vapour Deposition

The article presents a new technology of thermal barrier coating deposition called Plasma Spray – Physical Vapour Deposition (PS-PVD). The key feature of the process is the option of evaporating ceramic powder, which enables the deposition of a columnar ceramic coating. The essential properties of t...

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Main Authors: Goral Marek, Kotowski Slawomir, Sieniawski Jan
Format: Article
Language:English
Published: De Gruyter 2013-02-01
Series:High Temperature Materials and Processes
Subjects:
Online Access:https://doi.org/10.1515/htmp-2012-0051
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author Goral Marek
Kotowski Slawomir
Sieniawski Jan
author_facet Goral Marek
Kotowski Slawomir
Sieniawski Jan
author_sort Goral Marek
collection DOAJ
description The article presents a new technology of thermal barrier coating deposition called Plasma Spray – Physical Vapour Deposition (PS-PVD). The key feature of the process is the option of evaporating ceramic powder, which enables the deposition of a columnar ceramic coating. The essential properties of the PS-PVD process have been outlined, as well as recent literature references. In addition, the influence of a set of process conditions on the properties of the deposited coatings has been described. The new plasma-spraying PS-PVD method is a promising technology for the deposition of modern thermal barrier coatings on aircraft engine turbine blades.
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spelling doaj.art-162b5df91562493597b1054e987aa6d42022-12-21T21:35:37ZengDe GruyterHigh Temperature Materials and Processes0334-64552191-03242013-02-01321333910.1515/htmp-2012-0051The Technology of Plasma Spray Physical Vapour DepositionGoral MarekKotowski Slawomir0Sieniawski Jan1Research and Development Laboratory for Aerospace Materials, Rzeszow University of Technology, Powstancow Warszawy 12, 35-959 Rzeszow, PolandResearch and Development Laboratory for Aerospace Materials, Rzeszow University of Technology, Powstancow Warszawy 12, 35-959 Rzeszow, PolandThe article presents a new technology of thermal barrier coating deposition called Plasma Spray – Physical Vapour Deposition (PS-PVD). The key feature of the process is the option of evaporating ceramic powder, which enables the deposition of a columnar ceramic coating. The essential properties of the PS-PVD process have been outlined, as well as recent literature references. In addition, the influence of a set of process conditions on the properties of the deposited coatings has been described. The new plasma-spraying PS-PVD method is a promising technology for the deposition of modern thermal barrier coatings on aircraft engine turbine blades.https://doi.org/10.1515/htmp-2012-0051plasma sprayingdeposition films and coatingceramicsintermetallic compounds
spellingShingle Goral Marek
Kotowski Slawomir
Sieniawski Jan
The Technology of Plasma Spray Physical Vapour Deposition
High Temperature Materials and Processes
plasma spraying
deposition films and coating
ceramics
intermetallic compounds
title The Technology of Plasma Spray Physical Vapour Deposition
title_full The Technology of Plasma Spray Physical Vapour Deposition
title_fullStr The Technology of Plasma Spray Physical Vapour Deposition
title_full_unstemmed The Technology of Plasma Spray Physical Vapour Deposition
title_short The Technology of Plasma Spray Physical Vapour Deposition
title_sort technology of plasma spray physical vapour deposition
topic plasma spraying
deposition films and coating
ceramics
intermetallic compounds
url https://doi.org/10.1515/htmp-2012-0051
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