| Summary: | The structure of Cu<sub>50</sub>Zr<sub>50</sub> and Co<sub>56</sub>Ta<sub>35</sub>B<sub>9</sub> metallic glass thin films (MGTF) was effectively tailored via various applied substrate temperatures by means of the magnetron sputtering technology. Obviously enhanced hardness and elastic modulus are achieved by different compositional MGTFs by increasing the substrate temperature. Compared with the CuZr MGTFs, the CoTaB MGTF deposited at 473 K displays the smaller strain-rate sensitivity exponent, <i>m</i>, and a weaker spectrum intensity based on the nanoindentation creep test, suggesting its better creep resistance. In addition, the STZ volume of the CoTaB MGTF significantly decreases after depositing at higher temperature. According to the nano-scratch analysis, the CoTaB MGTF at the substrate temperatures of 473 K performs the shallower scratch width and the larger <i>H</i><sup>3</sup>/<i>E</i><sup>2</sup> value, indicating its better tribological property.
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