Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography
Micro/nano patterns based on quantum dots (QDs) are of great interest for applications ranging from electronics to photonics to sensing devices for biomedical purposes. Several patterning methods have been developed, but all lack the precision and reproducibility required to fabricate precise, compl...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
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MDPI AG
2023-07-01
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| Series: | Nanomaterials |
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| Online Access: | https://www.mdpi.com/2079-4991/13/14/2111 |
| _version_ | 1797587916680069120 |
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| author | Taewoo Ko Samir Kumar Sanghoon Shin Dongmin Seo Sungkyu Seo |
| author_facet | Taewoo Ko Samir Kumar Sanghoon Shin Dongmin Seo Sungkyu Seo |
| author_sort | Taewoo Ko |
| collection | DOAJ |
| description | Micro/nano patterns based on quantum dots (QDs) are of great interest for applications ranging from electronics to photonics to sensing devices for biomedical purposes. Several patterning methods have been developed, but all lack the precision and reproducibility required to fabricate precise, complex patterns of less than one micrometer in size, or require specialized crosslinking ligands, limiting their application. In this study, we present a novel approach to directly pattern QD nanopatterns by electron beam lithography using commercially available colloidal QDs without additional modifications. We have successfully generated reliable dot and line QD patterns with dimensions as small as 140 nm. In addition, we have shown that using a 10 nm SiO<sub>2</sub> spacer layer on a 50 nm Au layer substrate can double the fluorescence intensity compared to QDs on the Au layer without SiO<sub>2</sub>. This method takes advantage of traditional nanolithography without the need for a resist layer. |
| first_indexed | 2024-03-11T00:45:40Z |
| format | Article |
| id | doaj.art-196a52c789af47cfa58985a199f4b189 |
| institution | Directory Open Access Journal |
| issn | 2079-4991 |
| language | English |
| last_indexed | 2024-03-11T00:45:40Z |
| publishDate | 2023-07-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Nanomaterials |
| spelling | doaj.art-196a52c789af47cfa58985a199f4b1892023-11-18T20:46:09ZengMDPI AGNanomaterials2079-49912023-07-011314211110.3390/nano13142111Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam LithographyTaewoo Ko0Samir Kumar1Sanghoon Shin2Dongmin Seo3Sungkyu Seo4Department of Electronics and Information Engineering, Korea University, Sejong 30019, Republic of KoreaDepartment of Electronics and Information Engineering, Korea University, Sejong 30019, Republic of KoreaDepartment of Electronics and Information Engineering, Korea University, Sejong 30019, Republic of KoreaDepartment of Electrical Engineering, Semyung University, Jecheon 27136, Republic of KoreaDepartment of Electronics and Information Engineering, Korea University, Sejong 30019, Republic of KoreaMicro/nano patterns based on quantum dots (QDs) are of great interest for applications ranging from electronics to photonics to sensing devices for biomedical purposes. Several patterning methods have been developed, but all lack the precision and reproducibility required to fabricate precise, complex patterns of less than one micrometer in size, or require specialized crosslinking ligands, limiting their application. In this study, we present a novel approach to directly pattern QD nanopatterns by electron beam lithography using commercially available colloidal QDs without additional modifications. We have successfully generated reliable dot and line QD patterns with dimensions as small as 140 nm. In addition, we have shown that using a 10 nm SiO<sub>2</sub> spacer layer on a 50 nm Au layer substrate can double the fluorescence intensity compared to QDs on the Au layer without SiO<sub>2</sub>. This method takes advantage of traditional nanolithography without the need for a resist layer.https://www.mdpi.com/2079-4991/13/14/2111quantum dotsnanolithographypatterning methodselectron beam lithographycolloidal quantum dots |
| spellingShingle | Taewoo Ko Samir Kumar Sanghoon Shin Dongmin Seo Sungkyu Seo Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography Nanomaterials quantum dots nanolithography patterning methods electron beam lithography colloidal quantum dots |
| title | Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography |
| title_full | Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography |
| title_fullStr | Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography |
| title_full_unstemmed | Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography |
| title_short | Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography |
| title_sort | colloidal quantum dot nanolithography direct patterning via electron beam lithography |
| topic | quantum dots nanolithography patterning methods electron beam lithography colloidal quantum dots |
| url | https://www.mdpi.com/2079-4991/13/14/2111 |
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