Discharge current modes of high power impulse magnetron sputtering

Based on the production and disappearance of ions and electrons in the high power impulse magnetron sputtering plasma near the target, the expression of the discharge current is derived. Depending on the slope, six possible modes are deduced for the discharge current and the feasibility of each mode...

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Main Authors: Zhongzhen Wu, Shu Xiao, Zhengyong Ma, Suihan Cui, Shunping Ji, Xiubo Tian, Ricky K. Y. Fu, Paul K. Chu, Feng Pan
Format: Article
Language:English
Published: AIP Publishing LLC 2015-09-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4932135
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author Zhongzhen Wu
Shu Xiao
Zhengyong Ma
Suihan Cui
Shunping Ji
Xiubo Tian
Ricky K. Y. Fu
Paul K. Chu
Feng Pan
author_facet Zhongzhen Wu
Shu Xiao
Zhengyong Ma
Suihan Cui
Shunping Ji
Xiubo Tian
Ricky K. Y. Fu
Paul K. Chu
Feng Pan
author_sort Zhongzhen Wu
collection DOAJ
description Based on the production and disappearance of ions and electrons in the high power impulse magnetron sputtering plasma near the target, the expression of the discharge current is derived. Depending on the slope, six possible modes are deduced for the discharge current and the feasibility of each mode is discussed. The discharge parameters and target properties are simplified into the discharge voltage, sputtering yield, and ionization energy which mainly affect the discharge plasma. The relationship between these factors and the discharge current modes is also investigated.
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spelling doaj.art-1992fe0d0fe447bca93731faba474ca92022-12-21T23:01:38ZengAIP Publishing LLCAIP Advances2158-32262015-09-0159097178097178-810.1063/1.4932135094509ADVDischarge current modes of high power impulse magnetron sputteringZhongzhen Wu0Shu Xiao1Zhengyong Ma2Suihan Cui3Shunping Ji4Xiubo Tian5Ricky K. Y. Fu6Paul K. Chu7Feng Pan8School of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen 518055, ChinaSchool of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen 518055, ChinaSchool of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen 518055, ChinaSchool of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen 518055, ChinaSchool of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen 518055, ChinaState Key Laboratory of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001, ChinaDepartment of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong, ChinaDepartment of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong, ChinaSchool of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen 518055, ChinaBased on the production and disappearance of ions and electrons in the high power impulse magnetron sputtering plasma near the target, the expression of the discharge current is derived. Depending on the slope, six possible modes are deduced for the discharge current and the feasibility of each mode is discussed. The discharge parameters and target properties are simplified into the discharge voltage, sputtering yield, and ionization energy which mainly affect the discharge plasma. The relationship between these factors and the discharge current modes is also investigated.http://dx.doi.org/10.1063/1.4932135
spellingShingle Zhongzhen Wu
Shu Xiao
Zhengyong Ma
Suihan Cui
Shunping Ji
Xiubo Tian
Ricky K. Y. Fu
Paul K. Chu
Feng Pan
Discharge current modes of high power impulse magnetron sputtering
AIP Advances
title Discharge current modes of high power impulse magnetron sputtering
title_full Discharge current modes of high power impulse magnetron sputtering
title_fullStr Discharge current modes of high power impulse magnetron sputtering
title_full_unstemmed Discharge current modes of high power impulse magnetron sputtering
title_short Discharge current modes of high power impulse magnetron sputtering
title_sort discharge current modes of high power impulse magnetron sputtering
url http://dx.doi.org/10.1063/1.4932135
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