Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell Application

Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell Application

<p>Abstract</p> <p>We have developed a simple and scalable approach for fabricating sub-wavelength structures (SWS) on silicon nitride by means of self-assembled nickel nanoparticle masks and inductively coupled plasma (ICP) ion etching. Silicon nitride SWS surfaces with diameter o...

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Bibliographic Details
Main Authors: Lin Men-Ku, Huang Jin-Hua, Chang Chun-Wei, Sahoo KartikaChandra, Chang Edward-Yi, Lu Yi-Yao, Chen Chun-Chi
Format: Article
Language:English
Published: SpringerOpen 2009-01-01
Series:Nanoscale Research Letters
Subjects:
Sub-wavelength Structure
Solar cell
SWS fabrication
Reflectance
Anti-reflective coatings
Online Access:http://dx.doi.org/10.1007/s11671-009-9297-7
Description
Summary:<p>Abstract</p> <p>We have developed a simple and scalable approach for fabricating sub-wavelength structures (SWS) on silicon nitride by means of self-assembled nickel nanoparticle masks and inductively coupled plasma (ICP) ion etching. Silicon nitride SWS surfaces with diameter of 160&#8211;200 nm and a height of 140&#8211;150 nm were obtained. A low reflectivity below 1% was observed over wavelength from 590 to 680 nm. Using the measured reflectivity data in PC1D, the solar cell characteristics has been compared for single layer anti-reflection (SLAR) coatings and SWS and a 0.8% improvement in efficiency has been seen.</p>
ISSN:1931-7573
1556-276X

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