High-throughput design of functional-engineered MXene transistors with low-resistive contacts

Abstract Two-dimensional material-based transistors are being extensively investigated for CMOS (complementary metal oxide semiconductor) technology extension; nevertheless, downscaling appears to be challenging owing to high metal-semiconductor contact resistance. Here, we propose a functional grou...

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Main Authors: Sirsha Guha, Arnab Kabiraj, Santanu Mahapatra
Format: Article
Language:English
Published: Nature Portfolio 2022-09-01
Series:npj Computational Materials
Online Access:https://doi.org/10.1038/s41524-022-00885-6
_version_ 1818016803012476928
author Sirsha Guha
Arnab Kabiraj
Santanu Mahapatra
author_facet Sirsha Guha
Arnab Kabiraj
Santanu Mahapatra
author_sort Sirsha Guha
collection DOAJ
description Abstract Two-dimensional material-based transistors are being extensively investigated for CMOS (complementary metal oxide semiconductor) technology extension; nevertheless, downscaling appears to be challenging owing to high metal-semiconductor contact resistance. Here, we propose a functional group-engineered monolayer transistor architecture that takes advantage of MXenes’ natural material chemistry to offer low-resistive contacts. We design an automated, high-throughput computational pipeline that first performs hybrid density functional theory-based calculations to find 16 sets of complementary transistor configurations by screening more than 23,000 materials from an MXene database and then conducts self-consistent quantum transport calculations to simulate their current-voltage characteristics for channel lengths ranging from 10 nm to 3 nm. Performance of these devices has been found to meet the requirements of the international roadmap for devices and systems (IRDS) for several benchmark metrics (on current, power dissipation, delay, and subthreshold swing). The proposed balanced-mode, functional-engineered MXene transistors may lead to a realistic solution for the sub-decananometer technology scaling by enabling doping-free intrinsically low contact resistance.
first_indexed 2024-04-14T07:17:31Z
format Article
id doaj.art-19ffb98003f242bab141060dfaa9b721
institution Directory Open Access Journal
issn 2057-3960
language English
last_indexed 2024-04-14T07:17:31Z
publishDate 2022-09-01
publisher Nature Portfolio
record_format Article
series npj Computational Materials
spelling doaj.art-19ffb98003f242bab141060dfaa9b7212022-12-22T02:06:15ZengNature Portfolionpj Computational Materials2057-39602022-09-018111310.1038/s41524-022-00885-6High-throughput design of functional-engineered MXene transistors with low-resistive contactsSirsha Guha0Arnab Kabiraj1Santanu Mahapatra2Nano-Scale Device Research Laboratory, Department of Electronic Systems Engineering, Indian Institute of Science (IISc) BangaloreNano-Scale Device Research Laboratory, Department of Electronic Systems Engineering, Indian Institute of Science (IISc) BangaloreNano-Scale Device Research Laboratory, Department of Electronic Systems Engineering, Indian Institute of Science (IISc) BangaloreAbstract Two-dimensional material-based transistors are being extensively investigated for CMOS (complementary metal oxide semiconductor) technology extension; nevertheless, downscaling appears to be challenging owing to high metal-semiconductor contact resistance. Here, we propose a functional group-engineered monolayer transistor architecture that takes advantage of MXenes’ natural material chemistry to offer low-resistive contacts. We design an automated, high-throughput computational pipeline that first performs hybrid density functional theory-based calculations to find 16 sets of complementary transistor configurations by screening more than 23,000 materials from an MXene database and then conducts self-consistent quantum transport calculations to simulate their current-voltage characteristics for channel lengths ranging from 10 nm to 3 nm. Performance of these devices has been found to meet the requirements of the international roadmap for devices and systems (IRDS) for several benchmark metrics (on current, power dissipation, delay, and subthreshold swing). The proposed balanced-mode, functional-engineered MXene transistors may lead to a realistic solution for the sub-decananometer technology scaling by enabling doping-free intrinsically low contact resistance.https://doi.org/10.1038/s41524-022-00885-6
spellingShingle Sirsha Guha
Arnab Kabiraj
Santanu Mahapatra
High-throughput design of functional-engineered MXene transistors with low-resistive contacts
npj Computational Materials
title High-throughput design of functional-engineered MXene transistors with low-resistive contacts
title_full High-throughput design of functional-engineered MXene transistors with low-resistive contacts
title_fullStr High-throughput design of functional-engineered MXene transistors with low-resistive contacts
title_full_unstemmed High-throughput design of functional-engineered MXene transistors with low-resistive contacts
title_short High-throughput design of functional-engineered MXene transistors with low-resistive contacts
title_sort high throughput design of functional engineered mxene transistors with low resistive contacts
url https://doi.org/10.1038/s41524-022-00885-6
work_keys_str_mv AT sirshaguha highthroughputdesignoffunctionalengineeredmxenetransistorswithlowresistivecontacts
AT arnabkabiraj highthroughputdesignoffunctionalengineeredmxenetransistorswithlowresistivecontacts
AT santanumahapatra highthroughputdesignoffunctionalengineeredmxenetransistorswithlowresistivecontacts