Extraordinary Field Emission of Diamond Film Developed on a Graphite Substrate by Microwave Plasma Jet Chemical Vapor Deposition
This work reports both numerical and experimental studies of the reconditioning of a microwave plasma jet chemical vapor deposition (MPJCVD) system for the growth of diamond film. A three-dimensional plasma fluid model is constructed for investigating and conditioning the MPJCVD system and optimizin...
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| Format: | Article |
| Language: | English |
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MDPI AG
2023-02-01
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| Series: | Applied Sciences |
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| Online Access: | https://www.mdpi.com/2076-3417/13/4/2531 |
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| author | Hua-Yi Hsu Jing-Shyang Yen Chun-Yu Lin Chi-Wen Liu Kaviya Aranganadin Chii-Ruey Lin Jwo-Shiun Sun Ming-Chieh Lin |
| author_facet | Hua-Yi Hsu Jing-Shyang Yen Chun-Yu Lin Chi-Wen Liu Kaviya Aranganadin Chii-Ruey Lin Jwo-Shiun Sun Ming-Chieh Lin |
| author_sort | Hua-Yi Hsu |
| collection | DOAJ |
| description | This work reports both numerical and experimental studies of the reconditioning of a microwave plasma jet chemical vapor deposition (MPJCVD) system for the growth of diamond film. A three-dimensional plasma fluid model is constructed for investigating and conditioning the MPJCVD system and optimizing its operating conditions. The methodology solves electromagnetic wave and plasma dynamics self-consistently using an adaptive finite element method as implemented in COMSOL Multiphysics. The whole system has been modeled under varying parameters, including the reactor geometry, microwave power, and working gas pressure. Using an operating condition identical to the optimized simulation results, the MPJCVD system successfully fabricates a diamond-thin film on a graphite substrate. The SEM image reveals the presence of a diamond film uniformly distributed with particles of a size of ~1 μm. The field emission from the diamond film grown from our homemade MPJCVD system on the graphite substrate presents extraordinary properties, i.e., extremely high current density and relatively low turn-on voltage. The turn-on electric field observed could be as low as ~4 V/μm. This developed model provides valuable physical insights into the MPJCVD system, which guided performance improvements. The work may find applications in surface hardening and provide a better cold cathode for field electron emission. |
| first_indexed | 2024-03-11T09:11:41Z |
| format | Article |
| id | doaj.art-1b09cceca99b444e85f452490338fc85 |
| institution | Directory Open Access Journal |
| issn | 2076-3417 |
| language | English |
| last_indexed | 2024-03-11T09:11:41Z |
| publishDate | 2023-02-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Applied Sciences |
| spelling | doaj.art-1b09cceca99b444e85f452490338fc852023-11-16T18:57:07ZengMDPI AGApplied Sciences2076-34172023-02-01134253110.3390/app13042531Extraordinary Field Emission of Diamond Film Developed on a Graphite Substrate by Microwave Plasma Jet Chemical Vapor DepositionHua-Yi Hsu0Jing-Shyang Yen1Chun-Yu Lin2Chi-Wen Liu3Kaviya Aranganadin4Chii-Ruey Lin5Jwo-Shiun Sun6Ming-Chieh Lin7Department of Mechanical Engineering, National Taipei University of Technology, Taipei 10608, TaiwanDepartment of Electronic Engineering, National Taipei University of Technology, Taipei 10608, TaiwanDepartment of Mechanical Engineering, National Taipei University of Technology, Taipei 10608, TaiwanDepartment of Mechanical Engineering, National Taipei University of Technology, Taipei 10608, TaiwanMultidisciplinary Computational Laboratory, Department of Electrical and Biomedical Engineering, Hanyang University, Seoul 04763, Republic of KoreaDepartment of Mechanical Engineering, Minghsin University of Science and Technology, Hsinchu 30400, TaiwanDepartment of Electronic Engineering, National Taipei University of Technology, Taipei 10608, TaiwanMultidisciplinary Computational Laboratory, Department of Electrical and Biomedical Engineering, Hanyang University, Seoul 04763, Republic of KoreaThis work reports both numerical and experimental studies of the reconditioning of a microwave plasma jet chemical vapor deposition (MPJCVD) system for the growth of diamond film. A three-dimensional plasma fluid model is constructed for investigating and conditioning the MPJCVD system and optimizing its operating conditions. The methodology solves electromagnetic wave and plasma dynamics self-consistently using an adaptive finite element method as implemented in COMSOL Multiphysics. The whole system has been modeled under varying parameters, including the reactor geometry, microwave power, and working gas pressure. Using an operating condition identical to the optimized simulation results, the MPJCVD system successfully fabricates a diamond-thin film on a graphite substrate. The SEM image reveals the presence of a diamond film uniformly distributed with particles of a size of ~1 μm. The field emission from the diamond film grown from our homemade MPJCVD system on the graphite substrate presents extraordinary properties, i.e., extremely high current density and relatively low turn-on voltage. The turn-on electric field observed could be as low as ~4 V/μm. This developed model provides valuable physical insights into the MPJCVD system, which guided performance improvements. The work may find applications in surface hardening and provide a better cold cathode for field electron emission.https://www.mdpi.com/2076-3417/13/4/2531MPJCVDdiamond film fabricationplasmafield emission |
| spellingShingle | Hua-Yi Hsu Jing-Shyang Yen Chun-Yu Lin Chi-Wen Liu Kaviya Aranganadin Chii-Ruey Lin Jwo-Shiun Sun Ming-Chieh Lin Extraordinary Field Emission of Diamond Film Developed on a Graphite Substrate by Microwave Plasma Jet Chemical Vapor Deposition Applied Sciences MPJCVD diamond film fabrication plasma field emission |
| title | Extraordinary Field Emission of Diamond Film Developed on a Graphite Substrate by Microwave Plasma Jet Chemical Vapor Deposition |
| title_full | Extraordinary Field Emission of Diamond Film Developed on a Graphite Substrate by Microwave Plasma Jet Chemical Vapor Deposition |
| title_fullStr | Extraordinary Field Emission of Diamond Film Developed on a Graphite Substrate by Microwave Plasma Jet Chemical Vapor Deposition |
| title_full_unstemmed | Extraordinary Field Emission of Diamond Film Developed on a Graphite Substrate by Microwave Plasma Jet Chemical Vapor Deposition |
| title_short | Extraordinary Field Emission of Diamond Film Developed on a Graphite Substrate by Microwave Plasma Jet Chemical Vapor Deposition |
| title_sort | extraordinary field emission of diamond film developed on a graphite substrate by microwave plasma jet chemical vapor deposition |
| topic | MPJCVD diamond film fabrication plasma field emission |
| url | https://www.mdpi.com/2076-3417/13/4/2531 |
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