Identification of fragment ions produced from hexamethyldigermane and the production of low-energy beam of fragment ion possessing Ge-C bond

Fragment ions produced from hexamethyldigermane (HMDG) were identified using an ion beam system. The possible chemical formulae for these ions are CH3+, C2H4+, Ge+, GeCHx+, and GeC3Hx+. Among the fragment ions, GeCHx+ ions were mass-selected and irradiated to a Si substrate at room temperature. The...

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Main Authors: Satoru Yoshimura, Satoshi Sugimoto, Takae Takeuchi, Masato Kiuchi
Format: Article
Language:English
Published: AIP Publishing LLC 2019-02-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.5084181
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author Satoru Yoshimura
Satoshi Sugimoto
Takae Takeuchi
Masato Kiuchi
author_facet Satoru Yoshimura
Satoshi Sugimoto
Takae Takeuchi
Masato Kiuchi
author_sort Satoru Yoshimura
collection DOAJ
description Fragment ions produced from hexamethyldigermane (HMDG) were identified using an ion beam system. The possible chemical formulae for these ions are CH3+, C2H4+, Ge+, GeCHx+, and GeC3Hx+. Among the fragment ions, GeCHx+ ions were mass-selected and irradiated to a Si substrate at room temperature. The ion energy was set at approximately 10 eV. The analyses of the film deposited on the substrate suggested that GeCHx+ ion beam produced from HMDG was useful for germanium-carbon film formation.
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spelling doaj.art-1b4a6fd32c9b4c189a23e829b8a1f7912022-12-22T02:00:11ZengAIP Publishing LLCAIP Advances2158-32262019-02-0192025008025008-510.1063/1.5084181011902ADVIdentification of fragment ions produced from hexamethyldigermane and the production of low-energy beam of fragment ion possessing Ge-C bondSatoru Yoshimura0Satoshi Sugimoto1Takae Takeuchi2Masato Kiuchi3Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, JapanCenter for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, JapanDepartment of Chemistry, Nara Women’s University, Kitauoyanishi-machi, Nara, Nara 630-8506, JapanCenter for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, JapanFragment ions produced from hexamethyldigermane (HMDG) were identified using an ion beam system. The possible chemical formulae for these ions are CH3+, C2H4+, Ge+, GeCHx+, and GeC3Hx+. Among the fragment ions, GeCHx+ ions were mass-selected and irradiated to a Si substrate at room temperature. The ion energy was set at approximately 10 eV. The analyses of the film deposited on the substrate suggested that GeCHx+ ion beam produced from HMDG was useful for germanium-carbon film formation.http://dx.doi.org/10.1063/1.5084181
spellingShingle Satoru Yoshimura
Satoshi Sugimoto
Takae Takeuchi
Masato Kiuchi
Identification of fragment ions produced from hexamethyldigermane and the production of low-energy beam of fragment ion possessing Ge-C bond
AIP Advances
title Identification of fragment ions produced from hexamethyldigermane and the production of low-energy beam of fragment ion possessing Ge-C bond
title_full Identification of fragment ions produced from hexamethyldigermane and the production of low-energy beam of fragment ion possessing Ge-C bond
title_fullStr Identification of fragment ions produced from hexamethyldigermane and the production of low-energy beam of fragment ion possessing Ge-C bond
title_full_unstemmed Identification of fragment ions produced from hexamethyldigermane and the production of low-energy beam of fragment ion possessing Ge-C bond
title_short Identification of fragment ions produced from hexamethyldigermane and the production of low-energy beam of fragment ion possessing Ge-C bond
title_sort identification of fragment ions produced from hexamethyldigermane and the production of low energy beam of fragment ion possessing ge c bond
url http://dx.doi.org/10.1063/1.5084181
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