Identification of fragment ions produced from hexamethyldigermane and the production of low-energy beam of fragment ion possessing Ge-C bond
Fragment ions produced from hexamethyldigermane (HMDG) were identified using an ion beam system. The possible chemical formulae for these ions are CH3+, C2H4+, Ge+, GeCHx+, and GeC3Hx+. Among the fragment ions, GeCHx+ ions were mass-selected and irradiated to a Si substrate at room temperature. The...
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AIP Publishing LLC
2019-02-01
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Series: | AIP Advances |
Online Access: | http://dx.doi.org/10.1063/1.5084181 |
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author | Satoru Yoshimura Satoshi Sugimoto Takae Takeuchi Masato Kiuchi |
author_facet | Satoru Yoshimura Satoshi Sugimoto Takae Takeuchi Masato Kiuchi |
author_sort | Satoru Yoshimura |
collection | DOAJ |
description | Fragment ions produced from hexamethyldigermane (HMDG) were identified using an ion beam system. The possible chemical formulae for these ions are CH3+, C2H4+, Ge+, GeCHx+, and GeC3Hx+. Among the fragment ions, GeCHx+ ions were mass-selected and irradiated to a Si substrate at room temperature. The ion energy was set at approximately 10 eV. The analyses of the film deposited on the substrate suggested that GeCHx+ ion beam produced from HMDG was useful for germanium-carbon film formation. |
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institution | Directory Open Access Journal |
issn | 2158-3226 |
language | English |
last_indexed | 2024-12-10T05:45:05Z |
publishDate | 2019-02-01 |
publisher | AIP Publishing LLC |
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series | AIP Advances |
spelling | doaj.art-1b4a6fd32c9b4c189a23e829b8a1f7912022-12-22T02:00:11ZengAIP Publishing LLCAIP Advances2158-32262019-02-0192025008025008-510.1063/1.5084181011902ADVIdentification of fragment ions produced from hexamethyldigermane and the production of low-energy beam of fragment ion possessing Ge-C bondSatoru Yoshimura0Satoshi Sugimoto1Takae Takeuchi2Masato Kiuchi3Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, JapanCenter for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, JapanDepartment of Chemistry, Nara Women’s University, Kitauoyanishi-machi, Nara, Nara 630-8506, JapanCenter for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, JapanFragment ions produced from hexamethyldigermane (HMDG) were identified using an ion beam system. The possible chemical formulae for these ions are CH3+, C2H4+, Ge+, GeCHx+, and GeC3Hx+. Among the fragment ions, GeCHx+ ions were mass-selected and irradiated to a Si substrate at room temperature. The ion energy was set at approximately 10 eV. The analyses of the film deposited on the substrate suggested that GeCHx+ ion beam produced from HMDG was useful for germanium-carbon film formation.http://dx.doi.org/10.1063/1.5084181 |
spellingShingle | Satoru Yoshimura Satoshi Sugimoto Takae Takeuchi Masato Kiuchi Identification of fragment ions produced from hexamethyldigermane and the production of low-energy beam of fragment ion possessing Ge-C bond AIP Advances |
title | Identification of fragment ions produced from hexamethyldigermane and the production of low-energy beam of fragment ion possessing Ge-C bond |
title_full | Identification of fragment ions produced from hexamethyldigermane and the production of low-energy beam of fragment ion possessing Ge-C bond |
title_fullStr | Identification of fragment ions produced from hexamethyldigermane and the production of low-energy beam of fragment ion possessing Ge-C bond |
title_full_unstemmed | Identification of fragment ions produced from hexamethyldigermane and the production of low-energy beam of fragment ion possessing Ge-C bond |
title_short | Identification of fragment ions produced from hexamethyldigermane and the production of low-energy beam of fragment ion possessing Ge-C bond |
title_sort | identification of fragment ions produced from hexamethyldigermane and the production of low energy beam of fragment ion possessing ge c bond |
url | http://dx.doi.org/10.1063/1.5084181 |
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