The properties of metal contacts on TiO2 thin films produced by reactive magnetron sputtering
The article deals with research on volt-ampere characteristics of metal contacts (Al, Cr, In, Mo, Ti) on titanium dioxide thin films and influence of annealing in vacuum on their electric properties. Volt-ampere characteristics measurements were taken by three-probe method. There was established tha...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Politehperiodika
2010-10-01
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| Series: | Tekhnologiya i Konstruirovanie v Elektronnoi Apparature |
| Subjects: | |
| Online Access: | http://www.tkea.com.ua/tkea/2010/5-6_2010/pdf/14.zip |
| _version_ | 1811257115092713472 |
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| author | Brus V. V. Kovaluk Z. D. Maryanchuk P. D. Orletsky I. G. Maystruk E. V. |
| author_facet | Brus V. V. Kovaluk Z. D. Maryanchuk P. D. Orletsky I. G. Maystruk E. V. |
| author_sort | Brus V. V. |
| collection | DOAJ |
| description | The article deals with research on volt-ampere characteristics of metal contacts (Al, Cr, In, Mo, Ti) on titanium dioxide thin films and influence of annealing in vacuum on their electric properties. Volt-ampere characteristics measurements were taken by three-probe method. There was established that indium contact on TiO2 thin films possessed sharply defined ohmic properties. |
| first_indexed | 2024-04-12T17:51:31Z |
| format | Article |
| id | doaj.art-1b958fff73c2420cbadc2ae072749633 |
| institution | Directory Open Access Journal |
| issn | 2225-5818 |
| language | English |
| last_indexed | 2024-04-12T17:51:31Z |
| publishDate | 2010-10-01 |
| publisher | Politehperiodika |
| record_format | Article |
| series | Tekhnologiya i Konstruirovanie v Elektronnoi Apparature |
| spelling | doaj.art-1b958fff73c2420cbadc2ae0727496332022-12-22T03:22:28ZengPolitehperiodikaTekhnologiya i Konstruirovanie v Elektronnoi Apparature2225-58182010-10-015-66062The properties of metal contacts on TiO2 thin films produced by reactive magnetron sputteringBrus V. V.Kovaluk Z. D.Maryanchuk P. D.Orletsky I. G.Maystruk E. V.The article deals with research on volt-ampere characteristics of metal contacts (Al, Cr, In, Mo, Ti) on titanium dioxide thin films and influence of annealing in vacuum on their electric properties. Volt-ampere characteristics measurements were taken by three-probe method. There was established that indium contact on TiO2 thin films possessed sharply defined ohmic properties.http://www.tkea.com.ua/tkea/2010/5-6_2010/pdf/14.ziptitanium dioxidefilmmagnetron sputtering |
| spellingShingle | Brus V. V. Kovaluk Z. D. Maryanchuk P. D. Orletsky I. G. Maystruk E. V. The properties of metal contacts on TiO2 thin films produced by reactive magnetron sputtering Tekhnologiya i Konstruirovanie v Elektronnoi Apparature titanium dioxide film magnetron sputtering |
| title | The properties of metal contacts on TiO2 thin films produced by reactive magnetron sputtering |
| title_full | The properties of metal contacts on TiO2 thin films produced by reactive magnetron sputtering |
| title_fullStr | The properties of metal contacts on TiO2 thin films produced by reactive magnetron sputtering |
| title_full_unstemmed | The properties of metal contacts on TiO2 thin films produced by reactive magnetron sputtering |
| title_short | The properties of metal contacts on TiO2 thin films produced by reactive magnetron sputtering |
| title_sort | properties of metal contacts on tio2 thin films produced by reactive magnetron sputtering |
| topic | titanium dioxide film magnetron sputtering |
| url | http://www.tkea.com.ua/tkea/2010/5-6_2010/pdf/14.zip |
| work_keys_str_mv | AT brusvv thepropertiesofmetalcontactsontio2thinfilmsproducedbyreactivemagnetronsputtering AT kovalukzd thepropertiesofmetalcontactsontio2thinfilmsproducedbyreactivemagnetronsputtering AT maryanchukpd thepropertiesofmetalcontactsontio2thinfilmsproducedbyreactivemagnetronsputtering AT orletskyig thepropertiesofmetalcontactsontio2thinfilmsproducedbyreactivemagnetronsputtering AT maystrukev thepropertiesofmetalcontactsontio2thinfilmsproducedbyreactivemagnetronsputtering AT brusvv propertiesofmetalcontactsontio2thinfilmsproducedbyreactivemagnetronsputtering AT kovalukzd propertiesofmetalcontactsontio2thinfilmsproducedbyreactivemagnetronsputtering AT maryanchukpd propertiesofmetalcontactsontio2thinfilmsproducedbyreactivemagnetronsputtering AT orletskyig propertiesofmetalcontactsontio2thinfilmsproducedbyreactivemagnetronsputtering AT maystrukev propertiesofmetalcontactsontio2thinfilmsproducedbyreactivemagnetronsputtering |