Metrology of Nanostructures by Tomographic Mueller-Matrix Scatterometry
The development of necessary instrumentation and metrology at the nanoscale, especially fast, low-cost, and nondestructive metrology techniques, is of great significance for the realization of reliable and repeatable nanomanufacturing. In this work, we present the application of a homemade novel opt...
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| Format: | Article |
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MDPI AG
2018-12-01
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| Series: | Applied Sciences |
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| Online Access: | https://www.mdpi.com/2076-3417/8/12/2583 |
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| author | Chao Chen Xiuguo Chen Yating Shi Honggang Gu Hao Jiang Shiyuan Liu |
| author_facet | Chao Chen Xiuguo Chen Yating Shi Honggang Gu Hao Jiang Shiyuan Liu |
| author_sort | Chao Chen |
| collection | DOAJ |
| description | The development of necessary instrumentation and metrology at the nanoscale, especially fast, low-cost, and nondestructive metrology techniques, is of great significance for the realization of reliable and repeatable nanomanufacturing. In this work, we present the application of a homemade novel optical scatterometer called the tomographic Mueller-matrix scatterometer (TMS), for the measurement of photoresist gratings. The TMS adopts a dual rotating-compensator configuration and illuminates the nanostructure sequentially under test conditions by a plane wave, with varying illumination directions and records. For each illumination direction, the polarized scattered field along various directions of observation can be seen in the form of scattering Mueller matrices. That more scattering information is collected by TMS than conventional optical scatterometry ensures that it achieves better measurement sensitivity and accuracy. We also show the capability of TMS for determining both grating pitch and other structural parameters, which is incapable by current zeroth-order methods such as reflectometry- or ellipsometry-based scatterometry. |
| first_indexed | 2024-12-10T07:08:10Z |
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| id | doaj.art-1bd1e7cc7b894e2e9ebe0bf6a5720698 |
| institution | Directory Open Access Journal |
| issn | 2076-3417 |
| language | English |
| last_indexed | 2024-12-10T07:08:10Z |
| publishDate | 2018-12-01 |
| publisher | MDPI AG |
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| series | Applied Sciences |
| spelling | doaj.art-1bd1e7cc7b894e2e9ebe0bf6a57206982022-12-22T01:58:08ZengMDPI AGApplied Sciences2076-34172018-12-01812258310.3390/app8122583app8122583Metrology of Nanostructures by Tomographic Mueller-Matrix ScatterometryChao Chen0Xiuguo Chen1Yating Shi2Honggang Gu3Hao Jiang4Shiyuan Liu5State Key Laboratory for Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074, ChinaState Key Laboratory for Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074, ChinaState Key Laboratory for Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074, ChinaState Key Laboratory for Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074, ChinaState Key Laboratory for Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074, ChinaState Key Laboratory for Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074, ChinaThe development of necessary instrumentation and metrology at the nanoscale, especially fast, low-cost, and nondestructive metrology techniques, is of great significance for the realization of reliable and repeatable nanomanufacturing. In this work, we present the application of a homemade novel optical scatterometer called the tomographic Mueller-matrix scatterometer (TMS), for the measurement of photoresist gratings. The TMS adopts a dual rotating-compensator configuration and illuminates the nanostructure sequentially under test conditions by a plane wave, with varying illumination directions and records. For each illumination direction, the polarized scattered field along various directions of observation can be seen in the form of scattering Mueller matrices. That more scattering information is collected by TMS than conventional optical scatterometry ensures that it achieves better measurement sensitivity and accuracy. We also show the capability of TMS for determining both grating pitch and other structural parameters, which is incapable by current zeroth-order methods such as reflectometry- or ellipsometry-based scatterometry.https://www.mdpi.com/2076-3417/8/12/2583ellipsometryscatterometryMueller matrixdiffraction gratinginverse scatteringpitch measurement |
| spellingShingle | Chao Chen Xiuguo Chen Yating Shi Honggang Gu Hao Jiang Shiyuan Liu Metrology of Nanostructures by Tomographic Mueller-Matrix Scatterometry Applied Sciences ellipsometry scatterometry Mueller matrix diffraction grating inverse scattering pitch measurement |
| title | Metrology of Nanostructures by Tomographic Mueller-Matrix Scatterometry |
| title_full | Metrology of Nanostructures by Tomographic Mueller-Matrix Scatterometry |
| title_fullStr | Metrology of Nanostructures by Tomographic Mueller-Matrix Scatterometry |
| title_full_unstemmed | Metrology of Nanostructures by Tomographic Mueller-Matrix Scatterometry |
| title_short | Metrology of Nanostructures by Tomographic Mueller-Matrix Scatterometry |
| title_sort | metrology of nanostructures by tomographic mueller matrix scatterometry |
| topic | ellipsometry scatterometry Mueller matrix diffraction grating inverse scattering pitch measurement |
| url | https://www.mdpi.com/2076-3417/8/12/2583 |
| work_keys_str_mv | AT chaochen metrologyofnanostructuresbytomographicmuellermatrixscatterometry AT xiuguochen metrologyofnanostructuresbytomographicmuellermatrixscatterometry AT yatingshi metrologyofnanostructuresbytomographicmuellermatrixscatterometry AT hongganggu metrologyofnanostructuresbytomographicmuellermatrixscatterometry AT haojiang metrologyofnanostructuresbytomographicmuellermatrixscatterometry AT shiyuanliu metrologyofnanostructuresbytomographicmuellermatrixscatterometry |