Effect of processing parameters on microstructure of MoS2 ultra-thin films synthesized by chemical vapor deposition method
MoS2 ultra-thin layers are synthesized using a chemical vapor deposition method based on the sulfurization of molybdenum trioxide (MoO3). The ultra-thin layers are characterized by X-ray diffraction (XRD), photoluminescence (PL) spectroscopy and atomic force microscope (AFM). Based on our experiment...
Main Authors: | Yang Song, Yingzi Peng, Suping You, Kewei Sun, Ji Chen, Zhenghong Qian |
---|---|
Format: | Article |
Language: | English |
Published: |
AIP Publishing LLC
2015-06-01
|
Series: | AIP Advances |
Online Access: | http://dx.doi.org/10.1063/1.4922419 |
Similar Items
-
Perspective: Highly ordered MoS2 thin films grown by multi-step chemical vapor deposition process
by: S. N. Heo, et al.
Published: (2016-03-01) -
Edge-enriched 2D MoS 2 thin films grown by chemical vapor deposition for enhanced catalytic performance
by: Li, S, et al.
Published: (2016) -
Post-annealing in ultra-high vacuum or nitrogen plasma for MoS2 thin films deposited by magnetron sputtering
by: Chih Chao, et al.
Published: (2024-03-01) -
The Role of Carbon in Metal–Organic Chemical Vapor Deposition-Grown MoS<sub>2</sub> Films
by: Tianyu Hou, et al.
Published: (2023-11-01) -
MoS2 Synthesized by Atomic Layer Deposition as Cu Diffusion Barrier
by: Johanna (Sanne) H. Deijkers, et al.
Published: (2023-04-01)