Impact of surface topography and hydrophobicity in varied precursor concentrations of tenorite (CuO) films: a study of film properties and photocatalytic efficiency

Abstract Semiconductor films are crucial in photocatalysis applications, yet their controlled production remains challenging. Previous studies have mainly focused on deposition processes, heating rates, and doping of semiconductor oxides. In this paper, we introduce a novel method for fabricating te...

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Main Authors: Mohammed Althamthami, Hachemi Ben Temam, Elhachmi Guettaf Temam, Saâd Rahmane, Brahim Gasmi, Gamil Gamal Hasan
Format: Article
Language:English
Published: Nature Portfolio 2024-04-01
Series:Scientific Reports
Subjects:
Online Access:https://doi.org/10.1038/s41598-024-58744-x
_version_ 1797219848206417920
author Mohammed Althamthami
Hachemi Ben Temam
Elhachmi Guettaf Temam
Saâd Rahmane
Brahim Gasmi
Gamil Gamal Hasan
author_facet Mohammed Althamthami
Hachemi Ben Temam
Elhachmi Guettaf Temam
Saâd Rahmane
Brahim Gasmi
Gamil Gamal Hasan
author_sort Mohammed Althamthami
collection DOAJ
description Abstract Semiconductor films are crucial in photocatalysis applications, yet their controlled production remains challenging. Previous studies have mainly focused on deposition processes, heating rates, and doping of semiconductor oxides. In this paper, we introduce a novel method for fabricating tenorite (CuO) semiconductor films with varying precursor concentrations (0.01, 0.02, 0.04, 0.06, and 0.1 g/ml) using a dip-coating technique. We explore the impact of contact angles, 3D surface topography, and film thickness on photoactivation properties, areas with limited previous research focus. The results demonstrate that higher-concentration tenorite films (0.1 g/ml) exhibit rougher surfaces (77.3 nm), increased hydrophobicity (65.61°), improved light-harvesting ability, enhanced charge separation, and higher active oxygen output. The crystal sizes were within the range of 7.3–44.1 nm. Wettability tests show a 21.47% improvement in the 0.1 g/ml film surface under indirect sunlight compared to darkness. Transmittance rates in the 600 nm range were from 0.02 to 90.94%. The direct optical band gaps were 1.21–2.74 eV, while the indirect band gaps remained unaffected (0.9–1.11 eV). Surface morphology analysis reveals an increased presence of grains with higher concentrations. Regarding photocatalysis's impact on film morphology and copper content, SEM images reveal minimal changes in film structure, while copper content remains stable with slight variations. This suggests strong adhesion of tenorite to the film after photocatalysis. Tenorite thin films display exceptional photocatalytic efficiency, making them suitable for practical applications.
first_indexed 2024-04-24T12:40:10Z
format Article
id doaj.art-1c6d385915e24296ba232dc93b55211d
institution Directory Open Access Journal
issn 2045-2322
language English
last_indexed 2024-04-24T12:40:10Z
publishDate 2024-04-01
publisher Nature Portfolio
record_format Article
series Scientific Reports
spelling doaj.art-1c6d385915e24296ba232dc93b55211d2024-04-07T11:17:19ZengNature PortfolioScientific Reports2045-23222024-04-0114111510.1038/s41598-024-58744-xImpact of surface topography and hydrophobicity in varied precursor concentrations of tenorite (CuO) films: a study of film properties and photocatalytic efficiencyMohammed Althamthami0Hachemi Ben Temam1Elhachmi Guettaf Temam2Saâd Rahmane3Brahim Gasmi4Gamil Gamal Hasan5Physics Laboratory of Thin Films and Applications, Biskra UniversityPhysics Laboratory of Thin Films and Applications, Biskra UniversityPhysics Laboratory of Thin Films and Applications, Biskra UniversityPhysics Laboratory of Thin Films and Applications, Biskra UniversityPhysics Laboratory of Thin Films and Applications, Biskra UniversityUniversity of El OuedAbstract Semiconductor films are crucial in photocatalysis applications, yet their controlled production remains challenging. Previous studies have mainly focused on deposition processes, heating rates, and doping of semiconductor oxides. In this paper, we introduce a novel method for fabricating tenorite (CuO) semiconductor films with varying precursor concentrations (0.01, 0.02, 0.04, 0.06, and 0.1 g/ml) using a dip-coating technique. We explore the impact of contact angles, 3D surface topography, and film thickness on photoactivation properties, areas with limited previous research focus. The results demonstrate that higher-concentration tenorite films (0.1 g/ml) exhibit rougher surfaces (77.3 nm), increased hydrophobicity (65.61°), improved light-harvesting ability, enhanced charge separation, and higher active oxygen output. The crystal sizes were within the range of 7.3–44.1 nm. Wettability tests show a 21.47% improvement in the 0.1 g/ml film surface under indirect sunlight compared to darkness. Transmittance rates in the 600 nm range were from 0.02 to 90.94%. The direct optical band gaps were 1.21–2.74 eV, while the indirect band gaps remained unaffected (0.9–1.11 eV). Surface morphology analysis reveals an increased presence of grains with higher concentrations. Regarding photocatalysis's impact on film morphology and copper content, SEM images reveal minimal changes in film structure, while copper content remains stable with slight variations. This suggests strong adhesion of tenorite to the film after photocatalysis. Tenorite thin films display exceptional photocatalytic efficiency, making them suitable for practical applications.https://doi.org/10.1038/s41598-024-58744-xSurface roughnessWettabilityTenoritePhotocatalysisDip-coating
spellingShingle Mohammed Althamthami
Hachemi Ben Temam
Elhachmi Guettaf Temam
Saâd Rahmane
Brahim Gasmi
Gamil Gamal Hasan
Impact of surface topography and hydrophobicity in varied precursor concentrations of tenorite (CuO) films: a study of film properties and photocatalytic efficiency
Scientific Reports
Surface roughness
Wettability
Tenorite
Photocatalysis
Dip-coating
title Impact of surface topography and hydrophobicity in varied precursor concentrations of tenorite (CuO) films: a study of film properties and photocatalytic efficiency
title_full Impact of surface topography and hydrophobicity in varied precursor concentrations of tenorite (CuO) films: a study of film properties and photocatalytic efficiency
title_fullStr Impact of surface topography and hydrophobicity in varied precursor concentrations of tenorite (CuO) films: a study of film properties and photocatalytic efficiency
title_full_unstemmed Impact of surface topography and hydrophobicity in varied precursor concentrations of tenorite (CuO) films: a study of film properties and photocatalytic efficiency
title_short Impact of surface topography and hydrophobicity in varied precursor concentrations of tenorite (CuO) films: a study of film properties and photocatalytic efficiency
title_sort impact of surface topography and hydrophobicity in varied precursor concentrations of tenorite cuo films a study of film properties and photocatalytic efficiency
topic Surface roughness
Wettability
Tenorite
Photocatalysis
Dip-coating
url https://doi.org/10.1038/s41598-024-58744-x
work_keys_str_mv AT mohammedalthamthami impactofsurfacetopographyandhydrophobicityinvariedprecursorconcentrationsoftenoritecuofilmsastudyoffilmpropertiesandphotocatalyticefficiency
AT hachemibentemam impactofsurfacetopographyandhydrophobicityinvariedprecursorconcentrationsoftenoritecuofilmsastudyoffilmpropertiesandphotocatalyticefficiency
AT elhachmiguettaftemam impactofsurfacetopographyandhydrophobicityinvariedprecursorconcentrationsoftenoritecuofilmsastudyoffilmpropertiesandphotocatalyticefficiency
AT saadrahmane impactofsurfacetopographyandhydrophobicityinvariedprecursorconcentrationsoftenoritecuofilmsastudyoffilmpropertiesandphotocatalyticefficiency
AT brahimgasmi impactofsurfacetopographyandhydrophobicityinvariedprecursorconcentrationsoftenoritecuofilmsastudyoffilmpropertiesandphotocatalyticefficiency
AT gamilgamalhasan impactofsurfacetopographyandhydrophobicityinvariedprecursorconcentrationsoftenoritecuofilmsastudyoffilmpropertiesandphotocatalyticefficiency