Analysis of the Surface Microtexture of Sputtered Indium Tin Oxide Thin Films
The present research work involves the study of the 3-D surface microtexture of sputtered indium tin oxide (ITO) prepared on glass substrates by DC magnetron at room temperature. The samples were annealed at 450°C in air and were distributed into five groups, dependent on ambient combinations applie...
| Main Authors: | , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Polish Academy of Sciences
2021-05-01
|
| Series: | Archives of Metallurgy and Materials |
| Subjects: | |
| Online Access: | https://journals.pan.pl/Content/118799/PDF/AMM-2021-2-13-Stefan%20Talu.pdf |
| _version_ | 1811313397963161600 |
|---|---|
| author | Ş. Ţălu S. Kulesza M. Bramowicz K. Stępień D. Dastan |
| author_facet | Ş. Ţălu S. Kulesza M. Bramowicz K. Stępień D. Dastan |
| author_sort | Ş. Ţălu |
| collection | DOAJ |
| description | The present research work involves the study of the 3-D surface microtexture of sputtered indium tin oxide (ITO) prepared on glass substrates by DC magnetron at room temperature. The samples were annealed at 450°C in air and were distributed into five groups, dependent on ambient combinations applied, as follows: I group, using argon (Ar); II group, using argon with oxygen (Ar+O2); III group, using argon with oxygen and nitrogen (Ar+O2+N2); IV group, using argon with oxygen and hydrogen (Ar+O2+H2); and V group, using argon with oxygen, nitrogen, and hydrogen (Ar+O2+N2+H2). The characterization of the ITO thin film surface microtexture was carried out by atomic force microscopy (AFM). The AFM images were stereometrically quantitatively analyzed to obtain statistical parameters, by ISO 25178-2: 2012 and ASME B46.1-2009. The results have shown that the 3-D surface microtexture parameters change in accordance with different fabrication ambient combinations. |
| first_indexed | 2024-04-13T10:53:05Z |
| format | Article |
| id | doaj.art-1d8480ffe79842d7983313d63e38a71f |
| institution | Directory Open Access Journal |
| issn | 2300-1909 |
| language | English |
| last_indexed | 2024-04-13T10:53:05Z |
| publishDate | 2021-05-01 |
| publisher | Polish Academy of Sciences |
| record_format | Article |
| series | Archives of Metallurgy and Materials |
| spelling | doaj.art-1d8480ffe79842d7983313d63e38a71f2022-12-22T02:49:35ZengPolish Academy of SciencesArchives of Metallurgy and Materials2300-19092021-05-01vol. 66No 2443450https://doi.org/10.24425/amm.2021.135877Analysis of the Surface Microtexture of Sputtered Indium Tin Oxide Thin FilmsŞ. Ţălu0https://orcid.org/0000-0003-1311-7657S. Kulesza1https://orcid.org/0000-0003-2889-5611M. Bramowicz2https://orcid.org/0000-0002-7716-544XK. Stępień3https://orcid.org/0000-0002-4955-5344D. Dastan4Technical University of Cluj-Napoca, The Directorate of Research, Development and Innovation Management (DMCDI), Cluj-Napoca, 400020, RomaniaUniversity of Warmia and Mazury in Olsztyn, Faculty of Technical Sciences, 11 Oczapowskiego Str., 10-719 Olsztyn, PolandUniversity of Warmia and Mazury in Olsztyn, Faculty of Technical Sciences, 11 Oczapowskiego Str., 10-719 Olsztyn, PolandKielce University of Technology, Faculty of Mechatronics and Mechanical Engineering, Aleja 1000-lecia Państwa Polskiego 7, 25-314 Kielce, PolandGeorgia Institute of Technology, School of Materials Science and Engineering, Atlanta, Georgia 30332, USAThe present research work involves the study of the 3-D surface microtexture of sputtered indium tin oxide (ITO) prepared on glass substrates by DC magnetron at room temperature. The samples were annealed at 450°C in air and were distributed into five groups, dependent on ambient combinations applied, as follows: I group, using argon (Ar); II group, using argon with oxygen (Ar+O2); III group, using argon with oxygen and nitrogen (Ar+O2+N2); IV group, using argon with oxygen and hydrogen (Ar+O2+H2); and V group, using argon with oxygen, nitrogen, and hydrogen (Ar+O2+N2+H2). The characterization of the ITO thin film surface microtexture was carried out by atomic force microscopy (AFM). The AFM images were stereometrically quantitatively analyzed to obtain statistical parameters, by ISO 25178-2: 2012 and ASME B46.1-2009. The results have shown that the 3-D surface microtexture parameters change in accordance with different fabrication ambient combinations.https://journals.pan.pl/Content/118799/PDF/AMM-2021-2-13-Stefan%20Talu.pdfafmdc magnetron sputteringito thin filmsstereometric analysis3-d surface microtexture |
| spellingShingle | Ş. Ţălu S. Kulesza M. Bramowicz K. Stępień D. Dastan Analysis of the Surface Microtexture of Sputtered Indium Tin Oxide Thin Films Archives of Metallurgy and Materials afm dc magnetron sputtering ito thin films stereometric analysis 3-d surface microtexture |
| title | Analysis of the Surface Microtexture of Sputtered Indium Tin Oxide Thin Films |
| title_full | Analysis of the Surface Microtexture of Sputtered Indium Tin Oxide Thin Films |
| title_fullStr | Analysis of the Surface Microtexture of Sputtered Indium Tin Oxide Thin Films |
| title_full_unstemmed | Analysis of the Surface Microtexture of Sputtered Indium Tin Oxide Thin Films |
| title_short | Analysis of the Surface Microtexture of Sputtered Indium Tin Oxide Thin Films |
| title_sort | analysis of the surface microtexture of sputtered indium tin oxide thin films |
| topic | afm dc magnetron sputtering ito thin films stereometric analysis 3-d surface microtexture |
| url | https://journals.pan.pl/Content/118799/PDF/AMM-2021-2-13-Stefan%20Talu.pdf |
| work_keys_str_mv | AT stalu analysisofthesurfacemicrotextureofsputteredindiumtinoxidethinfilms AT skulesza analysisofthesurfacemicrotextureofsputteredindiumtinoxidethinfilms AT mbramowicz analysisofthesurfacemicrotextureofsputteredindiumtinoxidethinfilms AT kstepien analysisofthesurfacemicrotextureofsputteredindiumtinoxidethinfilms AT ddastan analysisofthesurfacemicrotextureofsputteredindiumtinoxidethinfilms |