Effect of annealing and UV-radiation time over micropore architecture of self-assembled block copolymer thin film

Effect of annealing and UV-radiation time over micropore architecture of self-assembled block copolymer thin film

Block copolymers have been recognized as versatile materials to prepare nanoporous polymer films or membranes, but their potential has not been completely explored. This study focuses on the formation and characterization of nanoporous polymer films based on poly(styrene)-block-(methylmethacrylate/m...

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Bibliographic Details
Main Authors: G. del C. Pizarro, O. G. Marambio, M. Jeria-Orell, C. M. Gonzalez-Henriquez, M. Sarabia-Vallejos, K. E. Geckeler
Format: Article
Language:English
Published: Budapest University of Technology 2015-06-01
Series:eXPRESS Polymer Letters
Subjects:
Polymer membranes
Self-assembled diblock copolym
thin films
irradiation
annealing
Online Access:http://www.expresspolymlett.com/letolt.php?file=EPL-0005852&mi=cd

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