Assembly of Arbitrary Designer Heterostructures with Atomically Clean Interfaces
Abstract Van der Waals heterostructures are an excellent platform for studying intriguing interface phenomena, such as moiré and proximity effects. Many of these phenomena occurring in such heterostructures' interfaces and surfaces have so far been hampered because of their high sensitivity to...
Main Authors: | , , , , , , , , , , , , |
---|---|
Format: | Article |
Language: | English |
Published: |
Wiley-VCH
2024-01-01
|
Series: | Advanced Materials Interfaces |
Subjects: | |
Online Access: | https://doi.org/10.1002/admi.202300658 |
_version_ | 1797365492922449920 |
---|---|
author | Keda Jin Tobias Wichmann Sabine Wenzel Tomas Samuely Oleksander Onufriienko Pavol Szabó Kenji Watanabe Takashi Taniguchi Jiaqiang Yan F. Stefan Tautz Felix Lüpke Markus Ternes Jose Martinez‐Castro |
author_facet | Keda Jin Tobias Wichmann Sabine Wenzel Tomas Samuely Oleksander Onufriienko Pavol Szabó Kenji Watanabe Takashi Taniguchi Jiaqiang Yan F. Stefan Tautz Felix Lüpke Markus Ternes Jose Martinez‐Castro |
author_sort | Keda Jin |
collection | DOAJ |
description | Abstract Van der Waals heterostructures are an excellent platform for studying intriguing interface phenomena, such as moiré and proximity effects. Many of these phenomena occurring in such heterostructures' interfaces and surfaces have so far been hampered because of their high sensitivity to disorder and interface contamination. Here, it reports a dry polymer‐based assembly technique to fabricate arbitrary designer van der Waals heterostructures with atomically clean surfaces. The key features of the suspended dry pick‐up and flip‐over assembly technique are: 1) the heterostructure surface never comes into contact with polymers, 2) the assemble is entirely solvent‐free, 3) it is entirely performed in a glovebox, and 4) it only requires temperatures below 130 °C. By performing ambient atomic force microscopy and atomically‐resolved scanning tunneling microscopy on example heterostructures, it demonstrates the fabrication of air‐sensitive heterostructures with ultra‐clean interfaces and surfaces. It envisions that, due to the avoidance of polymer melting, this technique is potentially compatible with heterostructure assembly under ultra‐high vacuum conditions, which promises ultimate heterostructure quality. |
first_indexed | 2024-03-08T16:49:47Z |
format | Article |
id | doaj.art-1dd5f301ee374a9283827b915b6fdafc |
institution | Directory Open Access Journal |
issn | 2196-7350 |
language | English |
last_indexed | 2024-03-08T16:49:47Z |
publishDate | 2024-01-01 |
publisher | Wiley-VCH |
record_format | Article |
series | Advanced Materials Interfaces |
spelling | doaj.art-1dd5f301ee374a9283827b915b6fdafc2024-01-05T04:51:02ZengWiley-VCHAdvanced Materials Interfaces2196-73502024-01-01111n/an/a10.1002/admi.202300658Assembly of Arbitrary Designer Heterostructures with Atomically Clean InterfacesKeda Jin0Tobias Wichmann1Sabine Wenzel2Tomas Samuely3Oleksander Onufriienko4Pavol Szabó5Kenji Watanabe6Takashi Taniguchi7Jiaqiang Yan8F. Stefan Tautz9Felix Lüpke10Markus Ternes11Jose Martinez‐Castro12Peter Grünberg Institut (PGI‐3) Forschungszentrum Jülich 52425 Jülich GermanyPeter Grünberg Institut (PGI‐3) Forschungszentrum Jülich 52425 Jülich GermanyPeter Grünberg Institut (PGI‐3) Forschungszentrum Jülich 52425 Jülich GermanyCentre of Low Temperature Physics, Faculty of Science Pavol Jozef Šafárik University & Institute of Experimental Physics, Slovak Academy of Sciences 04001 Košice SlovakiaCentre of Low Temperature Physics, Faculty of Science Pavol Jozef Šafárik University & Institute of Experimental Physics, Slovak Academy of Sciences 04001 Košice SlovakiaCentre of Low Temperature Physics, Faculty of Science Pavol Jozef Šafárik University & Institute of Experimental Physics, Slovak Academy of Sciences 04001 Košice SlovakiaResearch Center for Electronic and Optical Materials National Institute for Materials Science 1‐1 Namiki Tsukuba 305‐0044 JapanResearch Center for Materials Nanoarchitectonics National Institute for Materials Science 1‐1 Namiki Tsukuba 305‐0044 JapanMaterials Science and Technology Division Oak Ridge National Laboratory Oak Ridge TN 37831 USAPeter Grünberg Institut (PGI‐3) Forschungszentrum Jülich 52425 Jülich GermanyPeter Grünberg Institut (PGI‐3) Forschungszentrum Jülich 52425 Jülich GermanyPeter Grünberg Institut (PGI‐3) Forschungszentrum Jülich 52425 Jülich GermanyPeter Grünberg Institut (PGI‐3) Forschungszentrum Jülich 52425 Jülich GermanyAbstract Van der Waals heterostructures are an excellent platform for studying intriguing interface phenomena, such as moiré and proximity effects. Many of these phenomena occurring in such heterostructures' interfaces and surfaces have so far been hampered because of their high sensitivity to disorder and interface contamination. Here, it reports a dry polymer‐based assembly technique to fabricate arbitrary designer van der Waals heterostructures with atomically clean surfaces. The key features of the suspended dry pick‐up and flip‐over assembly technique are: 1) the heterostructure surface never comes into contact with polymers, 2) the assemble is entirely solvent‐free, 3) it is entirely performed in a glovebox, and 4) it only requires temperatures below 130 °C. By performing ambient atomic force microscopy and atomically‐resolved scanning tunneling microscopy on example heterostructures, it demonstrates the fabrication of air‐sensitive heterostructures with ultra‐clean interfaces and surfaces. It envisions that, due to the avoidance of polymer melting, this technique is potentially compatible with heterostructure assembly under ultra‐high vacuum conditions, which promises ultimate heterostructure quality.https://doi.org/10.1002/admi.2023006582D materialsheterostructuresinterfacesscanning tunneling microscopystacking |
spellingShingle | Keda Jin Tobias Wichmann Sabine Wenzel Tomas Samuely Oleksander Onufriienko Pavol Szabó Kenji Watanabe Takashi Taniguchi Jiaqiang Yan F. Stefan Tautz Felix Lüpke Markus Ternes Jose Martinez‐Castro Assembly of Arbitrary Designer Heterostructures with Atomically Clean Interfaces Advanced Materials Interfaces 2D materials heterostructures interfaces scanning tunneling microscopy stacking |
title | Assembly of Arbitrary Designer Heterostructures with Atomically Clean Interfaces |
title_full | Assembly of Arbitrary Designer Heterostructures with Atomically Clean Interfaces |
title_fullStr | Assembly of Arbitrary Designer Heterostructures with Atomically Clean Interfaces |
title_full_unstemmed | Assembly of Arbitrary Designer Heterostructures with Atomically Clean Interfaces |
title_short | Assembly of Arbitrary Designer Heterostructures with Atomically Clean Interfaces |
title_sort | assembly of arbitrary designer heterostructures with atomically clean interfaces |
topic | 2D materials heterostructures interfaces scanning tunneling microscopy stacking |
url | https://doi.org/10.1002/admi.202300658 |
work_keys_str_mv | AT kedajin assemblyofarbitrarydesignerheterostructureswithatomicallycleaninterfaces AT tobiaswichmann assemblyofarbitrarydesignerheterostructureswithatomicallycleaninterfaces AT sabinewenzel assemblyofarbitrarydesignerheterostructureswithatomicallycleaninterfaces AT tomassamuely assemblyofarbitrarydesignerheterostructureswithatomicallycleaninterfaces AT oleksanderonufriienko assemblyofarbitrarydesignerheterostructureswithatomicallycleaninterfaces AT pavolszabo assemblyofarbitrarydesignerheterostructureswithatomicallycleaninterfaces AT kenjiwatanabe assemblyofarbitrarydesignerheterostructureswithatomicallycleaninterfaces AT takashitaniguchi assemblyofarbitrarydesignerheterostructureswithatomicallycleaninterfaces AT jiaqiangyan assemblyofarbitrarydesignerheterostructureswithatomicallycleaninterfaces AT fstefantautz assemblyofarbitrarydesignerheterostructureswithatomicallycleaninterfaces AT felixlupke assemblyofarbitrarydesignerheterostructureswithatomicallycleaninterfaces AT markusternes assemblyofarbitrarydesignerheterostructureswithatomicallycleaninterfaces AT josemartinezcastro assemblyofarbitrarydesignerheterostructureswithatomicallycleaninterfaces |