Formation pattern of fractal relief for nanosized molybdenum films

Some patterns of formation of the fractal relief of nanosized molybdenum films on the mica surface are considered using the atomic force microscopy. The tools and techniques for post-processing and analyzing 2D images acquired through this specific research methodology have been thoroughly investiga...

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Main Authors: V.A. Anofriev, A.S. Antonov, D.V. Ivanov, E.M. Semenova, A.I. Ivanova, S.A. Tretiakov, M.S. Afanasiev, N.Yu. Sdobnyakov
Format: Article
Language:Russian
Published: Tver State University 2023-12-01
Series:Физико-химические аспекты изучения кластеров, наноструктур и наноматериалов
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Online Access:https://physchemaspects.ru/2023/doi-10-26456-pcascnn-2023-15-017/?lang=en
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author V.A. Anofriev
A.S. Antonov
D.V. Ivanov
E.M. Semenova
A.I. Ivanova
S.A. Tretiakov
M.S. Afanasiev
N.Yu. Sdobnyakov
author_facet V.A. Anofriev
A.S. Antonov
D.V. Ivanov
E.M. Semenova
A.I. Ivanova
S.A. Tretiakov
M.S. Afanasiev
N.Yu. Sdobnyakov
author_sort V.A. Anofriev
collection DOAJ
description Some patterns of formation of the fractal relief of nanosized molybdenum films on the mica surface are considered using the atomic force microscopy. The tools and techniques for post-processing and analyzing 2D images acquired through this specific research methodology have been thoroughly investigated. The significance of the contributions of errors and uncertainties to the final outcome of the acquired data is discussed. Additionally, a threshold detection method was applied to analyze the fractal dimension, allowing for the identification of areas of interest and exclusion of noise components, as well as regions not having scientific significance. The fractal dimension of the obtained agglomerates was determined at various scales, ranging from 0,5 to 3 µm. The next value Dc = 2,19 and Dc = 2,45 were obtained for the original images; Dc = 2,13 and Dc = 2,45, respectively, for the images processed using the threshold detection method. The obtained data provide prospects for further research and development of novel methods for synthesizing materials with specific properties.
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spelling doaj.art-1eccd7a6b9874e6793664e7b628ea4c12023-12-01T06:57:22ZrusTver State UniversityФизико-химические аспекты изучения кластеров, наноструктур и наноматериалов2226-44422658-43602023-12-0115173110.26456/pcascnn/2023.15.017Formation pattern of fractal relief for nanosized molybdenum filmsV.A. Anofriev0A.S. Antonov1D.V. Ivanov2E.M. Semenova3A.I. Ivanova4S.A. Tretiakov5M.S. Afanasiev6N.Yu. Sdobnyakov7Tver State University, Tver, RussiaTver State University, Tver, RussiaTver State University, Tver, RussiaTver State University, Tver, RussiaTver State University, Tver, RussiaTver State University, Tver, RussiaMIREA – Russian Technological University, Moscow, RussiaTver State University, Tver, RussiaSome patterns of formation of the fractal relief of nanosized molybdenum films on the mica surface are considered using the atomic force microscopy. The tools and techniques for post-processing and analyzing 2D images acquired through this specific research methodology have been thoroughly investigated. The significance of the contributions of errors and uncertainties to the final outcome of the acquired data is discussed. Additionally, a threshold detection method was applied to analyze the fractal dimension, allowing for the identification of areas of interest and exclusion of noise components, as well as regions not having scientific significance. The fractal dimension of the obtained agglomerates was determined at various scales, ranging from 0,5 to 3 µm. The next value Dc = 2,19 and Dc = 2,45 were obtained for the original images; Dc = 2,13 and Dc = 2,45, respectively, for the images processed using the threshold detection method. The obtained data provide prospects for further research and development of novel methods for synthesizing materials with specific properties.https://physchemaspects.ru/2023/doi-10-26456-pcascnn-2023-15-017/?lang=enatomic force microscopymagnetron sputteringfractal dimensionmolybdenum filmssoftware
spellingShingle V.A. Anofriev
A.S. Antonov
D.V. Ivanov
E.M. Semenova
A.I. Ivanova
S.A. Tretiakov
M.S. Afanasiev
N.Yu. Sdobnyakov
Formation pattern of fractal relief for nanosized molybdenum films
Физико-химические аспекты изучения кластеров, наноструктур и наноматериалов
atomic force microscopy
magnetron sputtering
fractal dimension
molybdenum films
software
title Formation pattern of fractal relief for nanosized molybdenum films
title_full Formation pattern of fractal relief for nanosized molybdenum films
title_fullStr Formation pattern of fractal relief for nanosized molybdenum films
title_full_unstemmed Formation pattern of fractal relief for nanosized molybdenum films
title_short Formation pattern of fractal relief for nanosized molybdenum films
title_sort formation pattern of fractal relief for nanosized molybdenum films
topic atomic force microscopy
magnetron sputtering
fractal dimension
molybdenum films
software
url https://physchemaspects.ru/2023/doi-10-26456-pcascnn-2023-15-017/?lang=en
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