Local Structural Modifications in Metallic Micropillars Induced by Plasma Focused Ion Beam Processing
A focused ion beam scanning electron microscope (FIB-SEM) is a powerful tool that is routinely used for scale imaging from the micro- to nanometer scales, micromachining, prototyping, and metrology. In spite of the significant capabilities of a FIB-SEM, there are inherent artefacts (e.g., structural...
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MDPI AG
2023-11-01
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| Online Access: | https://www.mdpi.com/1996-1944/16/22/7220 |
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| author | Kritika Singh Surya Snata Rout Christina Krywka Anton Davydok |
| author_facet | Kritika Singh Surya Snata Rout Christina Krywka Anton Davydok |
| author_sort | Kritika Singh |
| collection | DOAJ |
| description | A focused ion beam scanning electron microscope (FIB-SEM) is a powerful tool that is routinely used for scale imaging from the micro- to nanometer scales, micromachining, prototyping, and metrology. In spite of the significant capabilities of a FIB-SEM, there are inherent artefacts (e.g., structural defects, chemical interactions and phase changes, ion implantation, and material redeposition) that are produced due to the interaction of Ga<sup>+</sup> or other types of ions (e.g., Xe<sup>+</sup>, Ar<sup>+</sup>, O<sup>+</sup>, etc.) with the sample. In this study, we analyzed lattice distortion and ion implantation and subsequent material redeposition in metallic micropillars which were prepared using plasma focus ion beam (PFIB) milling. We utilized non-destructive synchrotron techniques such as X-ray fluorescence (XRF) and X-ray nanodiffraction to examine the micropillars prepared using Xe<sup>+</sup> ion energies of 10 keV and 30 keV. Our results demonstrate that higher Xe ion energy leads to higher density of implanted ions within the redeposited and milled material. The mixing of ions in the redeposited material significantly influences the lattice structure, causing deformation in regions with higher ion concentrations. Through an X-ray nanodiffraction analysis, we obtained numerical measurements of the strain fields induced in the regions, which revealed up to 0.2% lattice distortion in the ion bombardment direction. |
| first_indexed | 2024-03-09T16:38:52Z |
| format | Article |
| id | doaj.art-1fc1ea6a04664be0ab06d1390cfbcf21 |
| institution | Directory Open Access Journal |
| issn | 1996-1944 |
| language | English |
| last_indexed | 2024-03-09T16:38:52Z |
| publishDate | 2023-11-01 |
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| spelling | doaj.art-1fc1ea6a04664be0ab06d1390cfbcf212023-11-24T14:53:53ZengMDPI AGMaterials1996-19442023-11-011622722010.3390/ma16227220Local Structural Modifications in Metallic Micropillars Induced by Plasma Focused Ion Beam ProcessingKritika Singh0Surya Snata Rout1Christina Krywka2Anton Davydok3Institute of Material Physics, Hemholtz-Zentrum Hereon, Outstation at DESY Notkestr 85, 22607 Hamburg, GermanySchool of Earth and Planetary Sciences, National Institute of Science Education and Research, HBNI, Jatani 752050, IndiaInstitute of Material Physics, Hemholtz-Zentrum Hereon, Outstation at DESY Notkestr 85, 22607 Hamburg, GermanyInstitute of Material Physics, Hemholtz-Zentrum Hereon, Outstation at DESY Notkestr 85, 22607 Hamburg, GermanyA focused ion beam scanning electron microscope (FIB-SEM) is a powerful tool that is routinely used for scale imaging from the micro- to nanometer scales, micromachining, prototyping, and metrology. In spite of the significant capabilities of a FIB-SEM, there are inherent artefacts (e.g., structural defects, chemical interactions and phase changes, ion implantation, and material redeposition) that are produced due to the interaction of Ga<sup>+</sup> or other types of ions (e.g., Xe<sup>+</sup>, Ar<sup>+</sup>, O<sup>+</sup>, etc.) with the sample. In this study, we analyzed lattice distortion and ion implantation and subsequent material redeposition in metallic micropillars which were prepared using plasma focus ion beam (PFIB) milling. We utilized non-destructive synchrotron techniques such as X-ray fluorescence (XRF) and X-ray nanodiffraction to examine the micropillars prepared using Xe<sup>+</sup> ion energies of 10 keV and 30 keV. Our results demonstrate that higher Xe ion energy leads to higher density of implanted ions within the redeposited and milled material. The mixing of ions in the redeposited material significantly influences the lattice structure, causing deformation in regions with higher ion concentrations. Through an X-ray nanodiffraction analysis, we obtained numerical measurements of the strain fields induced in the regions, which revealed up to 0.2% lattice distortion in the ion bombardment direction.https://www.mdpi.com/1996-1944/16/22/7220focused ion beam millingTiAlmagnesiumsynchrotronnanodiffractionX-ray fluorescence |
| spellingShingle | Kritika Singh Surya Snata Rout Christina Krywka Anton Davydok Local Structural Modifications in Metallic Micropillars Induced by Plasma Focused Ion Beam Processing Materials focused ion beam milling TiAl magnesium synchrotron nanodiffraction X-ray fluorescence |
| title | Local Structural Modifications in Metallic Micropillars Induced by Plasma Focused Ion Beam Processing |
| title_full | Local Structural Modifications in Metallic Micropillars Induced by Plasma Focused Ion Beam Processing |
| title_fullStr | Local Structural Modifications in Metallic Micropillars Induced by Plasma Focused Ion Beam Processing |
| title_full_unstemmed | Local Structural Modifications in Metallic Micropillars Induced by Plasma Focused Ion Beam Processing |
| title_short | Local Structural Modifications in Metallic Micropillars Induced by Plasma Focused Ion Beam Processing |
| title_sort | local structural modifications in metallic micropillars induced by plasma focused ion beam processing |
| topic | focused ion beam milling TiAl magnesium synchrotron nanodiffraction X-ray fluorescence |
| url | https://www.mdpi.com/1996-1944/16/22/7220 |
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