Electrophysical properties of vanadium oxide films deposited by reactive magnetron sputtering

Electrophysical properties of vanadium oxide films deposited by reactive magnetron sputtering

The aim of this work was to study the effect of the gas composition during sputtering on the electrophysical properties of vanadium oxide films deposited by pulsed reactive magnetron sputtering of a vanadium target in an Ar/O2 medium of working gases.The dependences of the magnetron discharge voltag...

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Bibliographic Details
Main Authors: T. D. Nguen, A. I. Zanko, D. A. Golosov, S. M. Zavadski, S. N. Melnikov, V. V. Kolos
Format: Article
Language:Russian
Published: Educational institution «Belarusian State University of Informatics and Radioelectronics» 2020-10-01
Series:Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki
Subjects:
vanadium oxide
reactive magnetron sputtering
thin films
microbolometer
Online Access:https://doklady.bsuir.by/jour/article/view/2791

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