A magnetically controlled chemical–mechanical polishing (MC-CMP) approach for fabricating channel-cut silicon crystal optics for the High Energy Photon Source
Crystal monochromators are indispensable optical components for the majority of beamlines at synchrotron radiation facilities. Channel-cut monochromators are sometimes chosen to filter monochromatic X-ray beams by virtue of their ultrahigh angular stability. Nevertheless, high-accuracy polishing on...
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Language: | English |
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International Union of Crystallography
2023-01-01
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Series: | Journal of Synchrotron Radiation |
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Online Access: | http://scripts.iucr.org/cgi-bin/paper?S1600577522011122 |
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author | Zhen Hong Qianshun Diao Wei Xu Qingxi Yuan Junliang Yang Zhongliang Li Yongcheng Jiang Changrui Zhang Dongni Zhang Fang Liu Xiaowei Zhang Peng Liu Ye Tao Weifan Sheng Ming Li Yidong Zhao |
author_facet | Zhen Hong Qianshun Diao Wei Xu Qingxi Yuan Junliang Yang Zhongliang Li Yongcheng Jiang Changrui Zhang Dongni Zhang Fang Liu Xiaowei Zhang Peng Liu Ye Tao Weifan Sheng Ming Li Yidong Zhao |
author_sort | Zhen Hong |
collection | DOAJ |
description | Crystal monochromators are indispensable optical components for the majority of beamlines at synchrotron radiation facilities. Channel-cut monochromators are sometimes chosen to filter monochromatic X-ray beams by virtue of their ultrahigh angular stability. Nevertheless, high-accuracy polishing on the inner diffracting surfaces remains challenging, thus hampering their performance in preserving the coherence or wavefront of the photon beam. Herein, a magnetically controlled chemical–mechanical polishing (MC-CMP) approach has been successfully developed for fine polishing of the inner surfaces of channel-cut crystals. This MC-CMP process relieves the constraints of narrow working space dictated by small offset requirements and achieves near-perfect polishing on the surface of the crystals. Using this method, a high-quality surface with roughness of 0.614 nm (root mean square, r.m.s.) is obtained in a channel-cut crystal with 7 mm gap designed for beamlines at the High Energy Photon Source, a fourth-generation synchrotron radiation source under construction. On-line X-ray topography and rocking-curve measurements indicate that the stress residual layer on the crystal surface was removed. Firstly, the measured rocking-curve width is in good agreement with the theoretical value. Secondly, the peak reflectivity is very close to theoretical values. Thirdly, topographic images of the optics after polishing were uniform without any speckle or scratches. Only a nearly 2.5 nm-thick SiO2 layer was observed on the perfect crystalline matrix from high-resolution transmission electron microscopy photographs, indicating that the structure of the bulk material is defect- and dislocation-free. Future development of MC-CMP is promising for fabricating wavefront-preserving and ultra-stable channel-cut monochromators, which are crucial to exploit the merits of fourth-generation synchrotron radiation sources or hard X-ray free-electron lasers. |
first_indexed | 2024-04-11T00:48:42Z |
format | Article |
id | doaj.art-20ef160726d346aabb170fe0a626c6b8 |
institution | Directory Open Access Journal |
issn | 1600-5775 |
language | English |
last_indexed | 2024-04-11T00:48:42Z |
publishDate | 2023-01-01 |
publisher | International Union of Crystallography |
record_format | Article |
series | Journal of Synchrotron Radiation |
spelling | doaj.art-20ef160726d346aabb170fe0a626c6b82023-01-05T10:01:29ZengInternational Union of CrystallographyJournal of Synchrotron Radiation1600-57752023-01-01301848910.1107/S1600577522011122yi5130A magnetically controlled chemical–mechanical polishing (MC-CMP) approach for fabricating channel-cut silicon crystal optics for the High Energy Photon SourceZhen Hong0Qianshun Diao1Wei Xu2Qingxi Yuan3Junliang Yang4Zhongliang Li5Yongcheng Jiang6Changrui Zhang7Dongni Zhang8Fang Liu9Xiaowei Zhang10Peng Liu11Ye Tao12Weifan Sheng13Ming Li14Yidong Zhao15Beijing Synchrotron Radiation Facility, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, People's Republic of ChinaBeijing Synchrotron Radiation Facility, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, People's Republic of ChinaBeijing Synchrotron Radiation Facility, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, People's Republic of ChinaBeijing Synchrotron Radiation Facility, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, People's Republic of ChinaBeijing Synchrotron Radiation Facility, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, People's Republic of ChinaShanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai 201800, People's Republic of ChinaBeijing Synchrotron Radiation Facility, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, People's Republic of ChinaBeijing Synchrotron Radiation Facility, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, People's Republic of ChinaUniversity of Chinese Academy of Sciences, Chinese Academy of Sciences, Beijing 100049, People's Republic of ChinaBeijing Synchrotron Radiation Facility, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, People's Republic of ChinaBeijing Synchrotron Radiation Facility, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, People's Republic of ChinaBeijing Synchrotron Radiation Facility, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, People's Republic of ChinaBeijing Synchrotron Radiation Facility, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, People's Republic of ChinaBeijing Synchrotron Radiation Facility, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, People's Republic of ChinaBeijing Synchrotron Radiation Facility, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, People's Republic of ChinaBeijing Synchrotron Radiation Facility, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, People's Republic of ChinaCrystal monochromators are indispensable optical components for the majority of beamlines at synchrotron radiation facilities. Channel-cut monochromators are sometimes chosen to filter monochromatic X-ray beams by virtue of their ultrahigh angular stability. Nevertheless, high-accuracy polishing on the inner diffracting surfaces remains challenging, thus hampering their performance in preserving the coherence or wavefront of the photon beam. Herein, a magnetically controlled chemical–mechanical polishing (MC-CMP) approach has been successfully developed for fine polishing of the inner surfaces of channel-cut crystals. This MC-CMP process relieves the constraints of narrow working space dictated by small offset requirements and achieves near-perfect polishing on the surface of the crystals. Using this method, a high-quality surface with roughness of 0.614 nm (root mean square, r.m.s.) is obtained in a channel-cut crystal with 7 mm gap designed for beamlines at the High Energy Photon Source, a fourth-generation synchrotron radiation source under construction. On-line X-ray topography and rocking-curve measurements indicate that the stress residual layer on the crystal surface was removed. Firstly, the measured rocking-curve width is in good agreement with the theoretical value. Secondly, the peak reflectivity is very close to theoretical values. Thirdly, topographic images of the optics after polishing were uniform without any speckle or scratches. Only a nearly 2.5 nm-thick SiO2 layer was observed on the perfect crystalline matrix from high-resolution transmission electron microscopy photographs, indicating that the structure of the bulk material is defect- and dislocation-free. Future development of MC-CMP is promising for fabricating wavefront-preserving and ultra-stable channel-cut monochromators, which are crucial to exploit the merits of fourth-generation synchrotron radiation sources or hard X-ray free-electron lasers.http://scripts.iucr.org/cgi-bin/paper?S1600577522011122channel-cut crystalmc-cmphigh-accuracy roughnessresidue-stress freescratch- and speckle-free |
spellingShingle | Zhen Hong Qianshun Diao Wei Xu Qingxi Yuan Junliang Yang Zhongliang Li Yongcheng Jiang Changrui Zhang Dongni Zhang Fang Liu Xiaowei Zhang Peng Liu Ye Tao Weifan Sheng Ming Li Yidong Zhao A magnetically controlled chemical–mechanical polishing (MC-CMP) approach for fabricating channel-cut silicon crystal optics for the High Energy Photon Source Journal of Synchrotron Radiation channel-cut crystal mc-cmp high-accuracy roughness residue-stress free scratch- and speckle-free |
title | A magnetically controlled chemical–mechanical polishing (MC-CMP) approach for fabricating channel-cut silicon crystal optics for the High Energy Photon Source |
title_full | A magnetically controlled chemical–mechanical polishing (MC-CMP) approach for fabricating channel-cut silicon crystal optics for the High Energy Photon Source |
title_fullStr | A magnetically controlled chemical–mechanical polishing (MC-CMP) approach for fabricating channel-cut silicon crystal optics for the High Energy Photon Source |
title_full_unstemmed | A magnetically controlled chemical–mechanical polishing (MC-CMP) approach for fabricating channel-cut silicon crystal optics for the High Energy Photon Source |
title_short | A magnetically controlled chemical–mechanical polishing (MC-CMP) approach for fabricating channel-cut silicon crystal optics for the High Energy Photon Source |
title_sort | magnetically controlled chemical mechanical polishing mc cmp approach for fabricating channel cut silicon crystal optics for the high energy photon source |
topic | channel-cut crystal mc-cmp high-accuracy roughness residue-stress free scratch- and speckle-free |
url | http://scripts.iucr.org/cgi-bin/paper?S1600577522011122 |
work_keys_str_mv | AT zhenhong amagneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT qianshundiao amagneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT weixu amagneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT qingxiyuan amagneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT junliangyang amagneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT zhongliangli amagneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT yongchengjiang amagneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT changruizhang amagneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT dongnizhang amagneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT fangliu amagneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT xiaoweizhang amagneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT pengliu amagneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT yetao amagneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT weifansheng amagneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT mingli amagneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT yidongzhao amagneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT zhenhong magneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT qianshundiao magneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT weixu magneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT qingxiyuan magneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT junliangyang magneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT zhongliangli magneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT yongchengjiang magneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT changruizhang magneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT dongnizhang magneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT fangliu magneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT xiaoweizhang magneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT pengliu magneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT yetao magneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT weifansheng magneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT mingli magneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource AT yidongzhao magneticallycontrolledchemicalmechanicalpolishingmccmpapproachforfabricatingchannelcutsiliconcrystalopticsforthehighenergyphotonsource |