Atmospheric Plasma Deposition of SiO2 Films for Adhesion Promoting Layers on Titanium
This paper evaluates the deposition of silica layers at atmospheric pressure as a pretreatment for the structural bonding of titanium (Ti6Al4V, Ti15V3Cr3Sn3Al) in comparison to an anodizing process (NaTESi process). The SiO2 film was deposited using the LARGE plasma source, a linearly extended DC ar...
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| Format: | Article |
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MDPI AG
2014-12-01
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| Series: | Metals |
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| Online Access: | http://www.mdpi.com/2075-4701/4/4/639 |
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| author | Liliana Kotte Jana Haag Tobias Mertens Stefan Kaskel |
| author_facet | Liliana Kotte Jana Haag Tobias Mertens Stefan Kaskel |
| author_sort | Liliana Kotte |
| collection | DOAJ |
| description | This paper evaluates the deposition of silica layers at atmospheric pressure as a pretreatment for the structural bonding of titanium (Ti6Al4V, Ti15V3Cr3Sn3Al) in comparison to an anodizing process (NaTESi process). The SiO2 film was deposited using the LARGE plasma source, a linearly extended DC arc plasma source and applying hexamethyldisiloxane (HMDSO) as a precursor. The morphology of the surface was analyzed by means of SEM, while the characterization of the chemical composition of deposited plasma layers was done by XPS and FTIR. The long-term durability of bonded samples was evaluated by means of a wedge test in hot/wet condition. The almost stoichiometric SiO2 film features a good long-term stability and a high bonding strength compared to the films produced with the wet-chemical NaTESi process. |
| first_indexed | 2024-04-12T11:15:30Z |
| format | Article |
| id | doaj.art-2182177bb9294b1ab654fba14868fa84 |
| institution | Directory Open Access Journal |
| issn | 2075-4701 |
| language | English |
| last_indexed | 2024-04-12T11:15:30Z |
| publishDate | 2014-12-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Metals |
| spelling | doaj.art-2182177bb9294b1ab654fba14868fa842022-12-22T03:35:31ZengMDPI AGMetals2075-47012014-12-014463964610.3390/met4040639met4040639Atmospheric Plasma Deposition of SiO2 Films for Adhesion Promoting Layers on TitaniumLiliana Kotte0Jana Haag1Tobias Mertens2Stefan Kaskel3Department Chemical Surface and Reaction Technology, Fraunhofer Institute for Material and Beam Technology (IWS), Winterbergstraße 28, Dresden 01277, GermanyDepartment Metallic Technologies and Surface Engineering, Airbus Group Innovations Department, IW-MS, Munich 81663, GermanyDepartment Metallic Technologies and Surface Engineering, Airbus Group Innovations Department, IW-MS, Munich 81663, GermanyDepartment Chemical Surface and Reaction Technology, Fraunhofer Institute for Material and Beam Technology (IWS), Winterbergstraße 28, Dresden 01277, GermanyThis paper evaluates the deposition of silica layers at atmospheric pressure as a pretreatment for the structural bonding of titanium (Ti6Al4V, Ti15V3Cr3Sn3Al) in comparison to an anodizing process (NaTESi process). The SiO2 film was deposited using the LARGE plasma source, a linearly extended DC arc plasma source and applying hexamethyldisiloxane (HMDSO) as a precursor. The morphology of the surface was analyzed by means of SEM, while the characterization of the chemical composition of deposited plasma layers was done by XPS and FTIR. The long-term durability of bonded samples was evaluated by means of a wedge test in hot/wet condition. The almost stoichiometric SiO2 film features a good long-term stability and a high bonding strength compared to the films produced with the wet-chemical NaTESi process.http://www.mdpi.com/2075-4701/4/4/639SiO2 filmAP-PECVDtitanium alloyadhesion layerwedge test |
| spellingShingle | Liliana Kotte Jana Haag Tobias Mertens Stefan Kaskel Atmospheric Plasma Deposition of SiO2 Films for Adhesion Promoting Layers on Titanium Metals SiO2 film AP-PECVD titanium alloy adhesion layer wedge test |
| title | Atmospheric Plasma Deposition of SiO2 Films for Adhesion Promoting Layers on Titanium |
| title_full | Atmospheric Plasma Deposition of SiO2 Films for Adhesion Promoting Layers on Titanium |
| title_fullStr | Atmospheric Plasma Deposition of SiO2 Films for Adhesion Promoting Layers on Titanium |
| title_full_unstemmed | Atmospheric Plasma Deposition of SiO2 Films for Adhesion Promoting Layers on Titanium |
| title_short | Atmospheric Plasma Deposition of SiO2 Films for Adhesion Promoting Layers on Titanium |
| title_sort | atmospheric plasma deposition of sio2 films for adhesion promoting layers on titanium |
| topic | SiO2 film AP-PECVD titanium alloy adhesion layer wedge test |
| url | http://www.mdpi.com/2075-4701/4/4/639 |
| work_keys_str_mv | AT lilianakotte atmosphericplasmadepositionofsio2filmsforadhesionpromotinglayersontitanium AT janahaag atmosphericplasmadepositionofsio2filmsforadhesionpromotinglayersontitanium AT tobiasmertens atmosphericplasmadepositionofsio2filmsforadhesionpromotinglayersontitanium AT stefankaskel atmosphericplasmadepositionofsio2filmsforadhesionpromotinglayersontitanium |