| Summary: | There is a strong need for a fine three-dimensional metal patterning technique for fabricating next-generation devices such as patterned media and plasmon photonic and nano-scale electrodes. In addition, flexible and transparent electronic devices on plastic substrates are desired for wearable devices and flexible thin-film displays. Therefore, a technique for patterning metals onto plastic substrates is required. Nanotransfer printing (nTP) has received much attention recently because of its high throughput and high resolution compared to inkjet printing. However, it is difficult to create sub-100 nm metal patterns using nTP because the PDMS stamp is deformed by transfer pressure. Therefore, we have developed a technique for transferring three-dimensional metal patterns onto a polyethylene terephthalate (PET) substrate by nanoimprint lithography using a metal oxide release layer. The three-dimensional nanoimprint mold was fabricated by control of acceleration voltage electron beam lithography (CAV-EBL) with spin-on-glass (SOG). As a result, three-dimensional metal nano patterns were obtained using a metal oxide release layer. Moreover, the metal moth-eye structure, which has a very high aspect ratio, was transferred onto a PET substrate by applying our process to the moth-eye structure on glassy carbon.
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