Impact of defects on the structural and electrical transport properties of Sb2Te3 thin films by SHI irradiation

Implantation of defects is an attractive trend for the modification of important properties of thin films for practical applications. In the present attempt, an effective approach for tuning the native defects in thin films is reported. The films were sequentially irradiated at five different fluenc...

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Main Authors: Jyoti Yadav, Rini Singh, M.D. Anoop, Nisha Yadav, N. Srinivasa Rao, Fouran Singh, Kamlendra Awasthi, Manoj Kumar
Format: Article
Language:English
Published: Elsevier 2021-12-01
Series:Materials Letters: X
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S2590150821000545
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author Jyoti Yadav
Rini Singh
M.D. Anoop
Nisha Yadav
N. Srinivasa Rao
Fouran Singh
Kamlendra Awasthi
Manoj Kumar
author_facet Jyoti Yadav
Rini Singh
M.D. Anoop
Nisha Yadav
N. Srinivasa Rao
Fouran Singh
Kamlendra Awasthi
Manoj Kumar
author_sort Jyoti Yadav
collection DOAJ
description Implantation of defects is an attractive trend for the modification of important properties of thin films for practical applications. In the present attempt, an effective approach for tuning the native defects in thin films is reported. The films were sequentially irradiated at five different fluences (5 × 1011, 1 × 1012, 3 × 1012, 5 × 1012, and 1 × 1013 ions/cm2). The key role of high-energy Ni ion irradiation-induced native defects was observed by the modifications in the physical properties of samples. However, irradiation induces a structural phase transition through strain. The average crystallite size as determined from X-ray diffraction (XRD) peak broadening was found to be 19.3 ± 5 (nm). A monotonic increase in the lattice strain was observed up to a fluence of 5 × 1012 ions/cm2. The resistivity v/s temperature measurements revealed an increase in resistivity up to the fluence 3 × 1012 ions/cm2 indicating an increase in grain boundaries effect. Our findings provide an insight into the correlation of tuned properties with the defects induced by irradiation and also a route to have the defects in a precise and controlled way.
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spelling doaj.art-224cbe9d39ed455cb1efafbd1f18f2212022-12-21T23:41:17ZengElsevierMaterials Letters: X2590-15082021-12-0112100113Impact of defects on the structural and electrical transport properties of Sb2Te3 thin films by SHI irradiationJyoti Yadav0Rini Singh1M.D. Anoop2Nisha Yadav3N. Srinivasa Rao4Fouran Singh5Kamlendra Awasthi6Manoj Kumar7Department of Physics, Malaviya National Institute of Technology Jaipur, Rajasthan 302017, India; Corresponding authors at: Department of Physics, Malaviya National Institute of Technology Jaipur, Rajasthan 302017, India.Graduate School of Engineering, Hiroshima University, Higashi-Hiroshima 739-8527, JapanDepartment of Physics, Malaviya National Institute of Technology Jaipur, Rajasthan 302017, IndiaDepartment of Physics, Malaviya National Institute of Technology Jaipur, Rajasthan 302017, IndiaDepartment of Physics, Malaviya National Institute of Technology Jaipur, Rajasthan 302017, IndiaInter-University Accelerator Centre (IUAC), New Delhi 110067, IndiaDepartment of Physics, Malaviya National Institute of Technology Jaipur, Rajasthan 302017, IndiaDepartment of Physics, Malaviya National Institute of Technology Jaipur, Rajasthan 302017, India; Corresponding authors at: Department of Physics, Malaviya National Institute of Technology Jaipur, Rajasthan 302017, India.Implantation of defects is an attractive trend for the modification of important properties of thin films for practical applications. In the present attempt, an effective approach for tuning the native defects in thin films is reported. The films were sequentially irradiated at five different fluences (5 × 1011, 1 × 1012, 3 × 1012, 5 × 1012, and 1 × 1013 ions/cm2). The key role of high-energy Ni ion irradiation-induced native defects was observed by the modifications in the physical properties of samples. However, irradiation induces a structural phase transition through strain. The average crystallite size as determined from X-ray diffraction (XRD) peak broadening was found to be 19.3 ± 5 (nm). A monotonic increase in the lattice strain was observed up to a fluence of 5 × 1012 ions/cm2. The resistivity v/s temperature measurements revealed an increase in resistivity up to the fluence 3 × 1012 ions/cm2 indicating an increase in grain boundaries effect. Our findings provide an insight into the correlation of tuned properties with the defects induced by irradiation and also a route to have the defects in a precise and controlled way.http://www.sciencedirect.com/science/article/pii/S2590150821000545Thin filmsDefectsSemiconductors
spellingShingle Jyoti Yadav
Rini Singh
M.D. Anoop
Nisha Yadav
N. Srinivasa Rao
Fouran Singh
Kamlendra Awasthi
Manoj Kumar
Impact of defects on the structural and electrical transport properties of Sb2Te3 thin films by SHI irradiation
Materials Letters: X
Thin films
Defects
Semiconductors
title Impact of defects on the structural and electrical transport properties of Sb2Te3 thin films by SHI irradiation
title_full Impact of defects on the structural and electrical transport properties of Sb2Te3 thin films by SHI irradiation
title_fullStr Impact of defects on the structural and electrical transport properties of Sb2Te3 thin films by SHI irradiation
title_full_unstemmed Impact of defects on the structural and electrical transport properties of Sb2Te3 thin films by SHI irradiation
title_short Impact of defects on the structural and electrical transport properties of Sb2Te3 thin films by SHI irradiation
title_sort impact of defects on the structural and electrical transport properties of sb2te3 thin films by shi irradiation
topic Thin films
Defects
Semiconductors
url http://www.sciencedirect.com/science/article/pii/S2590150821000545
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