Unraveling the Mechanism of Maskless Nanopatterning of Black Silicon by CF4/H2 Plasma Reactive-Ion Etching

Unraveling the Mechanism of Maskless Nanopatterning of Black Silicon by CF4/H2 Plasma Reactive-Ion Etching

Bibliographic Details
Main Authors:	Francesco Ghezzi, Matteo Pedroni, Janez Kovač, Federica Causa, Anna Cremona, Mariano Anderle, Roberto Caniello, Silvia M. Pietralunga, Espedito Vassallo
Format:	Article
Language:	English
Published:	American Chemical Society 2022-07-01
Series:	ACS Omega
Online Access:	https://doi.org/10.1021/acsomega.2c02740

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