Stabilization of semiconductor surfaces through bulk dopants

We show by employing density-functional theory calculations (including a hybrid functional) that ZnO surfaces can be stabilized by bulk dopants. As an example, we study the bulk-terminated ZnO ( $000\bar{1}$ ) surface covered with half a monolayer of hydrogen. We demonstrate that deviations from thi...

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Bibliographic Details
Main Authors: Nikolaj Moll, Yong Xu, Oliver T Hofmann, Patrick Rinke
Format: Article
Language:English
Published: IOP Publishing 2013-01-01
Series:New Journal of Physics
Online Access:https://doi.org/10.1088/1367-2630/15/8/083009
Description
Summary:We show by employing density-functional theory calculations (including a hybrid functional) that ZnO surfaces can be stabilized by bulk dopants. As an example, we study the bulk-terminated ZnO ( $000\bar{1}$ ) surface covered with half a monolayer of hydrogen. We demonstrate that deviations from this half-monolayer coverage can be stabilized by electrons or holes from bulk dopants. The electron chemical potential therefore becomes a crucial parameter that cannot be neglected in semiconductor surface studies. As one result, we find that to form the defect-free surface with a half-monolayer coverage of hydrogen for n-type ZnO, ambient hydrogen background pressures are more conducive than high vacuum pressures.
ISSN:1367-2630