Direct Current Sputtering Deposition of the Metallic Ceramic Ti3SiC2 Thin Film with Improved Hydrophobicity and Reduced Surface Energy
Metallic ceramic compounds, such as Ti3SiC2, are innovative materials that combine the properties of metals and ceramics. However, most methods used in synthesizing these materials employ high deposition temperatures. Hence, in this work, Ti3SiC2 thin film was prepared and deposited on a steel sampl...
Main Authors: | Hamdi Muhyuddin Barra, Henry Ramos |
---|---|
Format: | Article |
Language: | English |
Published: |
Center for Policy, Research and Development Studies
2023-12-01
|
Series: | Recoletos Multidisciplinary Research Journal |
Subjects: | |
Online Access: | https://rmrj.usjr.edu.ph/rmrj/index.php/RMRJ/article/view/1628 |
Similar Items
-
Growth of stable SiC2N2-Si2CN4 phases during nitrogen incorporated sputter deposition of silicon carbide
by: A.S. Bhattacharyya
Published: (2024-06-01) -
Room Temperature Deposition of Nanocrystalline SiC Thin Films by DCMS/HiPIMS Co-Sputtering Technique
by: Vasile Tiron, et al.
Published: (2022-02-01) -
Effect of Carbon Concentration on the Sputtering of Carbon-Rich SiC Bombarded by Helium Ions
by: Xinghao Liang, et al.
Published: (2018-02-01) -
Production of Ti3SiC2 Nanolayered Ceramic
by: H Foratirad, et al.
Published: (2017-05-01) -
Effect of Microstructural and Tribological Behaviors of Sputtered Titanium Carbide Thin Film on Copper Substrate
by: Musibau Olalekan Ogunlana, et al.
Published: (2022-12-01)