Cytowanie według stylu APA (wyd. 7)

Qiao, W., Xie, T., Lu, J., & Jia, T. (2024). Development of machine learning models for the prediction of the skin sensitization potential of cosmetic compounds. PeerJ Inc.

Cytowanie według stylu Chicago (wyd. 17)

Qiao, Wu, Tong Xie, Jing Lu, i Tinghan Jia. Development of Machine Learning Models for the Prediction of the Skin Sensitization Potential of Cosmetic Compounds. PeerJ Inc, 2024.

Cytowanie według stylu MLA (wyd. 9)

Qiao, Wu, et al. Development of Machine Learning Models for the Prediction of the Skin Sensitization Potential of Cosmetic Compounds. PeerJ Inc, 2024.