Стиль цитування APA (7-ме видання)

Qiao, W., Xie, T., Lu, J., & Jia, T. (2024). Development of machine learning models for the prediction of the skin sensitization potential of cosmetic compounds. PeerJ Inc.

Чикаго стиль цитування (17-те видання)

Qiao, Wu, Tong Xie, Jing Lu, та Tinghan Jia. Development of Machine Learning Models for the Prediction of the Skin Sensitization Potential of Cosmetic Compounds. PeerJ Inc, 2024.

Стиль цитування MLA (9-ме видання)

Qiao, Wu, et al. Development of Machine Learning Models for the Prediction of the Skin Sensitization Potential of Cosmetic Compounds. PeerJ Inc, 2024.