Methods for reducing droplet formation density on the surface of thin semiconductor films by pulse laser deposition: review
The review discusses the most effective methods for reducing droplet density on the surface of thin films during pulsed laser deposition. This review highlights pulsed laser deposition as a promising technique for producing thin films from a wide range of materials. However, a significant challenge...
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| Format: | Article |
| Language: | Russian |
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Tver State University
2024-12-01
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| Series: | Физико-химические аспекты изучения кластеров, наноструктур и наноматериалов |
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| Online Access: | https://physchemaspects.ru/2024/doi-10-26456-pcascnn-2024-16-631/?lang=en |
| _version_ | 1826914349384466432 |
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| author | O.V. Devitsky |
| author_facet | O.V. Devitsky |
| author_sort | O.V. Devitsky |
| collection | DOAJ |
| description | The review discusses the most effective methods for reducing droplet density on the surface of thin films during pulsed laser deposition. This review highlights pulsed laser deposition as a promising technique for producing thin films from a wide range of materials. However, a significant challenge to its industrial application is the formation of droplets on the thin film surface. The primary causes of the droplet formation are identified, and a classification of methods to reduce the droplet density during pulsed laser deposition is provided. Completely eliminating droplets without compromising the quality or altering the stoichiometric composition of the thin films is exceedingly difficult, and no researchers have achieved this to date. The most effective strategy for reducing the droplet density involves optimizing the pulsed laser deposition parameters for specific material groups. Techniques such as using a segmented crystalline target, periodically rotating it at a specific speed, and employing excimer lasers at the energy densities slightly above the ablation threshold have been shown to reduce the droplet density on the thin film surface to as low as 103 cm-2. The physical and chemical processes occurring on the target surface have the greatest impact on the droplet formation. Among active methods, high-speed filtration is the most effective, capable of reducing droplet density to approximately 2 ⋅ 103 cm-2. |
| first_indexed | 2025-02-17T10:57:53Z |
| format | Article |
| id | doaj.art-2513af6c3aab47ca813e07092a9ff96b |
| institution | Directory Open Access Journal |
| issn | 2226-4442 2658-4360 |
| language | Russian |
| last_indexed | 2025-02-17T10:57:53Z |
| publishDate | 2024-12-01 |
| publisher | Tver State University |
| record_format | Article |
| series | Физико-химические аспекты изучения кластеров, наноструктур и наноматериалов |
| spelling | doaj.art-2513af6c3aab47ca813e07092a9ff96b2024-12-28T15:28:40ZrusTver State UniversityФизико-химические аспекты изучения кластеров, наноструктур и наноматериалов2226-44422658-43602024-12-011663164210.26456/pcascnn/2024.16.631Methods for reducing droplet formation density on the surface of thin semiconductor films by pulse laser deposition: reviewO.V. Devitsky0Federal Research Center Southern Scientific Center of the RAS, North Caucasus Federal University The review discusses the most effective methods for reducing droplet density on the surface of thin films during pulsed laser deposition. This review highlights pulsed laser deposition as a promising technique for producing thin films from a wide range of materials. However, a significant challenge to its industrial application is the formation of droplets on the thin film surface. The primary causes of the droplet formation are identified, and a classification of methods to reduce the droplet density during pulsed laser deposition is provided. Completely eliminating droplets without compromising the quality or altering the stoichiometric composition of the thin films is exceedingly difficult, and no researchers have achieved this to date. The most effective strategy for reducing the droplet density involves optimizing the pulsed laser deposition parameters for specific material groups. Techniques such as using a segmented crystalline target, periodically rotating it at a specific speed, and employing excimer lasers at the energy densities slightly above the ablation threshold have been shown to reduce the droplet density on the thin film surface to as low as 103 cm-2. The physical and chemical processes occurring on the target surface have the greatest impact on the droplet formation. Among active methods, high-speed filtration is the most effective, capable of reducing droplet density to approximately 2 ⋅ 103 cm-2. https://physchemaspects.ru/2024/doi-10-26456-pcascnn-2024-16-631/?lang=enpulsed laser depositionthin filmsdroplet densityhigh-speed filtrationsegmented targetdual-pulse laser depositionlaser energy density |
| spellingShingle | O.V. Devitsky Methods for reducing droplet formation density on the surface of thin semiconductor films by pulse laser deposition: review Физико-химические аспекты изучения кластеров, наноструктур и наноматериалов pulsed laser deposition thin films droplet density high-speed filtration segmented target dual-pulse laser deposition laser energy density |
| title | Methods for reducing droplet formation density on the surface of thin semiconductor films by pulse laser deposition: review |
| title_full | Methods for reducing droplet formation density on the surface of thin semiconductor films by pulse laser deposition: review |
| title_fullStr | Methods for reducing droplet formation density on the surface of thin semiconductor films by pulse laser deposition: review |
| title_full_unstemmed | Methods for reducing droplet formation density on the surface of thin semiconductor films by pulse laser deposition: review |
| title_short | Methods for reducing droplet formation density on the surface of thin semiconductor films by pulse laser deposition: review |
| title_sort | methods for reducing droplet formation density on the surface of thin semiconductor films by pulse laser deposition review |
| topic | pulsed laser deposition thin films droplet density high-speed filtration segmented target dual-pulse laser deposition laser energy density |
| url | https://physchemaspects.ru/2024/doi-10-26456-pcascnn-2024-16-631/?lang=en |
| work_keys_str_mv | AT ovdevitsky methodsforreducingdropletformationdensityonthesurfaceofthinsemiconductorfilmsbypulselaserdepositionreview |