Specifications and control of spatial frequency errors of components in two-beam laser static holographic exposure for pulse compression grating fabrication
The large-aperture pulse compression grating (PCG) is a critical component in generating an ultra-high-intensity, ultra-short-pulse laser; however, the size of the PCG manufactured by transmission holographic exposure is limited to large-scale high-quality materials. The reflective method is a poten...
| Main Authors: | , , , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Cambridge University Press
2024-01-01
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| Series: | High Power Laser Science and Engineering |
| Subjects: | |
| Online Access: | https://www.cambridge.org/core/product/identifier/S2095471923000816/type/journal_article |
| _version_ | 1827390120132608000 |
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| author | Chen Hu Songlin Wan Guochang Jiang Haojin Gu Yibin Zhang Yunxia Jin Shijie Liu Chengqiang Zhao Hongchao Cao Chaoyang Wei Jianda Shao |
| author_facet | Chen Hu Songlin Wan Guochang Jiang Haojin Gu Yibin Zhang Yunxia Jin Shijie Liu Chengqiang Zhao Hongchao Cao Chaoyang Wei Jianda Shao |
| author_sort | Chen Hu |
| collection | DOAJ |
| description | The large-aperture pulse compression grating (PCG) is a critical component in generating an ultra-high-intensity, ultra-short-pulse laser; however, the size of the PCG manufactured by transmission holographic exposure is limited to large-scale high-quality materials. The reflective method is a potential way for solving the size limitation, but there is still no successful precedent due to the lack of scientific specifications and advanced processing technology of exposure mirrors. In this paper, an analytical model is developed to clarify the specifications of components, and advanced processing technology is adopted to control the spatial frequency errors. Hereafter, we have successfully fabricated a multilayer dielectric grating of 200 mm × 150 mm by using an off-axis reflective exposure system with Φ300 mm. This demonstration proves that PCGs can be manufactured by using the reflection holographic exposure method and shows the potential for manufacturing the meter-level gratings used in 100 petawatt class high-power lasers. |
| first_indexed | 2024-03-08T16:46:48Z |
| format | Article |
| id | doaj.art-2615ae8bc4f74905bea7c2eed525b588 |
| institution | Directory Open Access Journal |
| issn | 2095-4719 2052-3289 |
| language | English |
| last_indexed | 2024-03-08T16:46:48Z |
| publishDate | 2024-01-01 |
| publisher | Cambridge University Press |
| record_format | Article |
| series | High Power Laser Science and Engineering |
| spelling | doaj.art-2615ae8bc4f74905bea7c2eed525b5882024-01-05T09:16:23ZengCambridge University PressHigh Power Laser Science and Engineering2095-47192052-32892024-01-011210.1017/hpl.2023.81Specifications and control of spatial frequency errors of components in two-beam laser static holographic exposure for pulse compression grating fabricationChen Hu0https://orcid.org/0009-0001-3157-2365Songlin Wan1Guochang Jiang2Haojin Gu3Yibin Zhang4Yunxia Jin5https://orcid.org/0000-0001-7138-1048Shijie Liu6Chengqiang Zhao7Hongchao Cao8Chaoyang Wei9Jianda Shao10Precision Optical Manufacturing and Testing Center, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (CAS), Shanghai, China Key Laboratory for High Power Laser Material of Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, China Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing, ChinaPrecision Optical Manufacturing and Testing Center, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (CAS), Shanghai, China Key Laboratory for High Power Laser Material of Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, ChinaPrecision Optical Manufacturing and Testing Center, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (CAS), Shanghai, China Key Laboratory for High Power Laser Material of Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, ChinaPrecision Optical Manufacturing and Testing Center, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (CAS), Shanghai, China Key Laboratory for High Power Laser Material of Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, ChinaKey Laboratory for High Power Laser Material of Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, ChinaKey Laboratory for High Power Laser Material of Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, ChinaPrecision Optical Manufacturing and Testing Center, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (CAS), Shanghai, China Key Laboratory for High Power Laser Material of Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, China Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing, China China-Russian Belt and Road Joint Laboratory on Laser Science, Shanghai, ChinaKey Laboratory for High Power Laser Material of Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, ChinaKey Laboratory for High Power Laser Material of Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, ChinaPrecision Optical Manufacturing and Testing Center, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (CAS), Shanghai, China Key Laboratory for High Power Laser Material of Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, China Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing, ChinaPrecision Optical Manufacturing and Testing Center, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (CAS), Shanghai, China Key Laboratory for High Power Laser Material of Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, China Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing, China Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou, China China-Russian Belt and Road Joint Laboratory on Laser Science, Shanghai, ChinaThe large-aperture pulse compression grating (PCG) is a critical component in generating an ultra-high-intensity, ultra-short-pulse laser; however, the size of the PCG manufactured by transmission holographic exposure is limited to large-scale high-quality materials. The reflective method is a potential way for solving the size limitation, but there is still no successful precedent due to the lack of scientific specifications and advanced processing technology of exposure mirrors. In this paper, an analytical model is developed to clarify the specifications of components, and advanced processing technology is adopted to control the spatial frequency errors. Hereafter, we have successfully fabricated a multilayer dielectric grating of 200 mm × 150 mm by using an off-axis reflective exposure system with Φ300 mm. This demonstration proves that PCGs can be manufactured by using the reflection holographic exposure method and shows the potential for manufacturing the meter-level gratings used in 100 petawatt class high-power lasers.https://www.cambridge.org/core/product/identifier/S2095471923000816/type/journal_articlehigh-power laseroff-axis reflective exposure systempulse compression gratingspatial frequency errorsspecifications |
| spellingShingle | Chen Hu Songlin Wan Guochang Jiang Haojin Gu Yibin Zhang Yunxia Jin Shijie Liu Chengqiang Zhao Hongchao Cao Chaoyang Wei Jianda Shao Specifications and control of spatial frequency errors of components in two-beam laser static holographic exposure for pulse compression grating fabrication High Power Laser Science and Engineering high-power laser off-axis reflective exposure system pulse compression grating spatial frequency errors specifications |
| title | Specifications and control of spatial frequency errors of components in two-beam laser static holographic exposure for pulse compression grating fabrication |
| title_full | Specifications and control of spatial frequency errors of components in two-beam laser static holographic exposure for pulse compression grating fabrication |
| title_fullStr | Specifications and control of spatial frequency errors of components in two-beam laser static holographic exposure for pulse compression grating fabrication |
| title_full_unstemmed | Specifications and control of spatial frequency errors of components in two-beam laser static holographic exposure for pulse compression grating fabrication |
| title_short | Specifications and control of spatial frequency errors of components in two-beam laser static holographic exposure for pulse compression grating fabrication |
| title_sort | specifications and control of spatial frequency errors of components in two beam laser static holographic exposure for pulse compression grating fabrication |
| topic | high-power laser off-axis reflective exposure system pulse compression grating spatial frequency errors specifications |
| url | https://www.cambridge.org/core/product/identifier/S2095471923000816/type/journal_article |
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