Gate voltage and drain current stress instabilities in amorphous In–Ga–Zn–O thin-film transistors with an asymmetric graphene electrode

The gate voltage and drain current stress instabilities in amorphous In–Ga–Zn–O thin-film transistors (a-IGZO TFTs) having an asymmetric graphene electrode structure are studied. A large positive shift in the threshold voltage, which is well fitted to a stretched-exponential equation, and an increas...

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Main Authors: Joonwoo Kim, Sung Myung, Hee-Yeon Noh, Soon Moon Jeong, Jaewook Jeong
Format: Article
Language:English
Published: AIP Publishing LLC 2015-09-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4931084
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author Joonwoo Kim
Sung Myung
Hee-Yeon Noh
Soon Moon Jeong
Jaewook Jeong
author_facet Joonwoo Kim
Sung Myung
Hee-Yeon Noh
Soon Moon Jeong
Jaewook Jeong
author_sort Joonwoo Kim
collection DOAJ
description The gate voltage and drain current stress instabilities in amorphous In–Ga–Zn–O thin-film transistors (a-IGZO TFTs) having an asymmetric graphene electrode structure are studied. A large positive shift in the threshold voltage, which is well fitted to a stretched-exponential equation, and an increase in the subthreshold slope are observed when drain current stress is applied. This is due to an increase in temperature caused by power dissipation in the graphene/a-IGZO contact region, in addition to the channel region, which is different from the behavior in a-IGZO TFTs with a conventional transparent electrode.
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spelling doaj.art-27fc421c7fc84b8db4c7cf45d7ed4c022022-12-22T01:32:37ZengAIP Publishing LLCAIP Advances2158-32262015-09-0159097141097141-810.1063/1.4931084041509ADVGate voltage and drain current stress instabilities in amorphous In–Ga–Zn–O thin-film transistors with an asymmetric graphene electrodeJoonwoo Kim0Sung Myung1Hee-Yeon Noh2Soon Moon Jeong3Jaewook Jeong4Nano & Bio Research Division, Daegu Gyeongbuk Institute of Science and Technology, Daegu, 42988, South KoreaThin Film Materials Research Group, Korea Research Institute of Chemical Technology, Daejeon, 34114, South KoreaNano & Bio Research Division, Daegu Gyeongbuk Institute of Science and Technology, Daegu, 42988, South KoreaNano & Bio Research Division, Daegu Gyeongbuk Institute of Science and Technology, Daegu, 42988, South KoreaSchool of Information and Communication Engineering, Chungbuk National University, 28644, Cheongju, Chungbuk, South KoreaThe gate voltage and drain current stress instabilities in amorphous In–Ga–Zn–O thin-film transistors (a-IGZO TFTs) having an asymmetric graphene electrode structure are studied. A large positive shift in the threshold voltage, which is well fitted to a stretched-exponential equation, and an increase in the subthreshold slope are observed when drain current stress is applied. This is due to an increase in temperature caused by power dissipation in the graphene/a-IGZO contact region, in addition to the channel region, which is different from the behavior in a-IGZO TFTs with a conventional transparent electrode.http://dx.doi.org/10.1063/1.4931084
spellingShingle Joonwoo Kim
Sung Myung
Hee-Yeon Noh
Soon Moon Jeong
Jaewook Jeong
Gate voltage and drain current stress instabilities in amorphous In–Ga–Zn–O thin-film transistors with an asymmetric graphene electrode
AIP Advances
title Gate voltage and drain current stress instabilities in amorphous In–Ga–Zn–O thin-film transistors with an asymmetric graphene electrode
title_full Gate voltage and drain current stress instabilities in amorphous In–Ga–Zn–O thin-film transistors with an asymmetric graphene electrode
title_fullStr Gate voltage and drain current stress instabilities in amorphous In–Ga–Zn–O thin-film transistors with an asymmetric graphene electrode
title_full_unstemmed Gate voltage and drain current stress instabilities in amorphous In–Ga–Zn–O thin-film transistors with an asymmetric graphene electrode
title_short Gate voltage and drain current stress instabilities in amorphous In–Ga–Zn–O thin-film transistors with an asymmetric graphene electrode
title_sort gate voltage and drain current stress instabilities in amorphous in ga zn o thin film transistors with an asymmetric graphene electrode
url http://dx.doi.org/10.1063/1.4931084
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