Low Resistance TiO<sub>2</sub>/p-Si Heterojunction for Tandem Solar Cells

Low Resistance TiO<sub>2</sub>/p-Si Heterojunction for Tandem Solar Cells

Niobium-doped titanium dioxide (Ti<sub>1−x</sub>Nb<sub>x</sub>O<sub>2</sub>) films were grown on <i>p</i>-type Si substrates at low temperature (170 °C) using an atomic layer deposition technique. The as-deposited films were amorphous and showed low el...

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Bibliographic Details
Main Authors: Steponas Ašmontas, Maksimas Anbinderis, Jonas Gradauskas, Remigijus Juškėnas, Konstantinas Leinartas, Andžej Lučun, Algirdas Selskis, Laurynas Staišiūnas, Sandra Stanionytė, Algirdas Sužiedėlis, Aldis Šilėnas, Edmundas Širmulis
Format: Article
Language:English
Published: MDPI AG 2020-06-01
Series:Materials
Subjects:
thin films
solar cells
TiO<sub>2</sub>/p-Si heterojunction
atomic layer deposition
Online Access:https://www.mdpi.com/1996-1944/13/12/2857

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https://www.mdpi.com/1996-1944/13/12/2857

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