Effect of High Temperature Treatment on the Photoluminescence of InGaN Multiple Quantum Wells

In this work, the photoluminescence (PL) properties of three as-grown InGaN/GaN multiple quantum well (MQW) structures which are heat-treated under different temperatures with nitrogen (N<sub>2</sub>) atmosphere are investigated. Temperature-dependent photoluminescence (PL) analysis was...

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Main Authors: Yachen Wang, Feng Liang, Degang Zhao, Yuhao Ben, Jing Yang, Zongshun Liu, Ping Chen
Format: Article
Language:English
Published: MDPI AG 2022-06-01
Series:Crystals
Subjects:
Online Access:https://www.mdpi.com/2073-4352/12/6/839
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author Yachen Wang
Feng Liang
Degang Zhao
Yuhao Ben
Jing Yang
Zongshun Liu
Ping Chen
author_facet Yachen Wang
Feng Liang
Degang Zhao
Yuhao Ben
Jing Yang
Zongshun Liu
Ping Chen
author_sort Yachen Wang
collection DOAJ
description In this work, the photoluminescence (PL) properties of three as-grown InGaN/GaN multiple quantum well (MQW) structures which are heat-treated under different temperatures with nitrogen (N<sub>2</sub>) atmosphere are investigated. Temperature-dependent photoluminescence (PL) analysis was used to characterize the depth of localized states and defect density formed in MQWs. By fitting the positions of luminescence peaks with an LSE model, we find that deeper localized states are formed in the MQWs after high-temperature treatment. The experimental results show that the luminescence intensity of the sample heat-treated at 880 °C is significantly improved, which may be due to the shielding effect of In clusters on defects. While the luminescence efficiency decreases because of the higher defect density caused by the decomposition of the InGaN QW layer when the sample is heat-treated at 1020 °C. Moreover, the atomic force microscope results show that the increase in heat-treatment temperature leads to an increase in the width of surface steps due to the rearrangement of surface atoms in a high-temperature environment.
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spelling doaj.art-2c35c62e87aa40ffb16961d0a8eec76a2023-11-23T16:12:47ZengMDPI AGCrystals2073-43522022-06-0112683910.3390/cryst12060839Effect of High Temperature Treatment on the Photoluminescence of InGaN Multiple Quantum WellsYachen Wang0Feng Liang1Degang Zhao2Yuhao Ben3Jing Yang4Zongshun Liu5Ping Chen6State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, ChinaState Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, ChinaState Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, ChinaState Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, ChinaState Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, ChinaState Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, ChinaState Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, ChinaIn this work, the photoluminescence (PL) properties of three as-grown InGaN/GaN multiple quantum well (MQW) structures which are heat-treated under different temperatures with nitrogen (N<sub>2</sub>) atmosphere are investigated. Temperature-dependent photoluminescence (PL) analysis was used to characterize the depth of localized states and defect density formed in MQWs. By fitting the positions of luminescence peaks with an LSE model, we find that deeper localized states are formed in the MQWs after high-temperature treatment. The experimental results show that the luminescence intensity of the sample heat-treated at 880 °C is significantly improved, which may be due to the shielding effect of In clusters on defects. While the luminescence efficiency decreases because of the higher defect density caused by the decomposition of the InGaN QW layer when the sample is heat-treated at 1020 °C. Moreover, the atomic force microscope results show that the increase in heat-treatment temperature leads to an increase in the width of surface steps due to the rearrangement of surface atoms in a high-temperature environment.https://www.mdpi.com/2073-4352/12/6/839InGaN quantum wellphotoluminescencelocalized stateshigh-temperature treatment
spellingShingle Yachen Wang
Feng Liang
Degang Zhao
Yuhao Ben
Jing Yang
Zongshun Liu
Ping Chen
Effect of High Temperature Treatment on the Photoluminescence of InGaN Multiple Quantum Wells
Crystals
InGaN quantum well
photoluminescence
localized states
high-temperature treatment
title Effect of High Temperature Treatment on the Photoluminescence of InGaN Multiple Quantum Wells
title_full Effect of High Temperature Treatment on the Photoluminescence of InGaN Multiple Quantum Wells
title_fullStr Effect of High Temperature Treatment on the Photoluminescence of InGaN Multiple Quantum Wells
title_full_unstemmed Effect of High Temperature Treatment on the Photoluminescence of InGaN Multiple Quantum Wells
title_short Effect of High Temperature Treatment on the Photoluminescence of InGaN Multiple Quantum Wells
title_sort effect of high temperature treatment on the photoluminescence of ingan multiple quantum wells
topic InGaN quantum well
photoluminescence
localized states
high-temperature treatment
url https://www.mdpi.com/2073-4352/12/6/839
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