A review on TSV reliability

This paper reviews the reliability of TSV(through silicon via) in three aspects: thermal stress, process and piezoresistive effect. The thermal stress reliability of TSV is reflected in the great difference of thermal expansion coefficient between different materials, too large thermal stress may le...

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Main Authors: Wang Shuo, Ma Kui, Yang Fashun
Format: Article
Language:zho
Published: National Computer System Engineering Research Institute of China 2021-02-01
Series:Dianzi Jishu Yingyong
Subjects:
Online Access:http://www.chinaaet.com/article/3000128861
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author Wang Shuo
Ma Kui
Yang Fashun
author_facet Wang Shuo
Ma Kui
Yang Fashun
author_sort Wang Shuo
collection DOAJ
description This paper reviews the reliability of TSV(through silicon via) in three aspects: thermal stress, process and piezoresistive effect. The thermal stress reliability of TSV is reflected in the great difference of thermal expansion coefficient between different materials, too large thermal stress may lead to interface delamination and cracks; the reliability of TSV process is reflected in the continuity of side wall and the quality of filled copper; the carrier mobility in the active region will be affected by the thermal stress of TSV. A KOZ(keep out zone) area around TSV is defined. The KOZ is set to the region where the carrier mobility does not exceed 5%. When the carrier mobility exceeds 5%, the timing of the circuit may be destroyed and the integrated circuit will fail.
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spelling doaj.art-2cfa5bce20ee477e965b4010ae3643812022-12-21T19:57:53ZzhoNational Computer System Engineering Research Institute of ChinaDianzi Jishu Yingyong0258-79982021-02-014721610.16157/j.issn.0258-7998.2007673000128861A review on TSV reliabilityWang Shuo0Ma Kui1Yang Fashun2College of Big Data and Information Engineering,Guizhou University,Guiyang 550025,ChinaCollege of Big Data and Information Engineering,Guizhou University,Guiyang 550025,ChinaCollege of Big Data and Information Engineering,Guizhou University,Guiyang 550025,ChinaThis paper reviews the reliability of TSV(through silicon via) in three aspects: thermal stress, process and piezoresistive effect. The thermal stress reliability of TSV is reflected in the great difference of thermal expansion coefficient between different materials, too large thermal stress may lead to interface delamination and cracks; the reliability of TSV process is reflected in the continuity of side wall and the quality of filled copper; the carrier mobility in the active region will be affected by the thermal stress of TSV. A KOZ(keep out zone) area around TSV is defined. The KOZ is set to the region where the carrier mobility does not exceed 5%. When the carrier mobility exceeds 5%, the timing of the circuit may be destroyed and the integrated circuit will fail.http://www.chinaaet.com/article/3000128861tsvkozthe thermal stresscoefficient of thermal expansion
spellingShingle Wang Shuo
Ma Kui
Yang Fashun
A review on TSV reliability
Dianzi Jishu Yingyong
tsv
koz
the thermal stress
coefficient of thermal expansion
title A review on TSV reliability
title_full A review on TSV reliability
title_fullStr A review on TSV reliability
title_full_unstemmed A review on TSV reliability
title_short A review on TSV reliability
title_sort review on tsv reliability
topic tsv
koz
the thermal stress
coefficient of thermal expansion
url http://www.chinaaet.com/article/3000128861
work_keys_str_mv AT wangshuo areviewontsvreliability
AT makui areviewontsvreliability
AT yangfashun areviewontsvreliability
AT wangshuo reviewontsvreliability
AT makui reviewontsvreliability
AT yangfashun reviewontsvreliability