Route to Cost-Effective Fabrication of Wafer-Scale Nanostructure through Self-Priming Nanoimprint
Nanoimprint technology is powerful for fabricating nanostructures in a large area. However, expensive equipment, high cost, and complex process conditions hinder the application of nano-imprinting technology. Therefore, double-layer self-priming nanoimprint technology was proposed to fabricate order...
| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
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MDPI AG
2021-01-01
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| Series: | Micromachines |
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| Online Access: | https://www.mdpi.com/2072-666X/12/2/121 |
| _version_ | 1797407887230763008 |
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| author | Yue Su Zhaoxin Geng Weihao Fang Xiaoqing Lv Shicai Wang Zhengtai Ma Weihua Pei |
| author_facet | Yue Su Zhaoxin Geng Weihao Fang Xiaoqing Lv Shicai Wang Zhengtai Ma Weihua Pei |
| author_sort | Yue Su |
| collection | DOAJ |
| description | Nanoimprint technology is powerful for fabricating nanostructures in a large area. However, expensive equipment, high cost, and complex process conditions hinder the application of nano-imprinting technology. Therefore, double-layer self-priming nanoimprint technology was proposed to fabricate ordered metal nanostructures uniformly on 4-inch soft and hard substrates without the aid of expensive instruments. Different nanostructure (gratings, nanoholes and nanoparticles) and different materials (metal and MoS<sub>2</sub>) were patterned, which shows wide application of double-layer self-priming nanoimprint technology. Moreover, by a double-layer system, the width and the height of metal can be adjusted through the photoresist thickness and developing condition, which provide a programmable way to fabricate different nanostructures using a single mold. The double-layer self-priming nanoimprint method can be applied in poor condition without equipment and be programmable in nanostructure parameters using a single mold, which reduces the cost of instruments and molds. |
| first_indexed | 2024-03-09T03:49:14Z |
| format | Article |
| id | doaj.art-2d52c895c5ae4376a87cdf137f38eaef |
| institution | Directory Open Access Journal |
| issn | 2072-666X |
| language | English |
| last_indexed | 2024-03-09T03:49:14Z |
| publishDate | 2021-01-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Micromachines |
| spelling | doaj.art-2d52c895c5ae4376a87cdf137f38eaef2023-12-03T14:29:48ZengMDPI AGMicromachines2072-666X2021-01-0112212110.3390/mi12020121Route to Cost-Effective Fabrication of Wafer-Scale Nanostructure through Self-Priming NanoimprintYue Su0Zhaoxin Geng1Weihao Fang2Xiaoqing Lv3Shicai Wang4Zhengtai Ma5Weihua Pei6State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, ChinaSchool of Information Engineering, Minzu University of China, Beijing 100081, ChinaState Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, ChinaState Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, ChinaState Key Laboratory of Crystal Materials, Shandong University, Jinan 250100, ChinaState Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, ChinaState Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, ChinaNanoimprint technology is powerful for fabricating nanostructures in a large area. However, expensive equipment, high cost, and complex process conditions hinder the application of nano-imprinting technology. Therefore, double-layer self-priming nanoimprint technology was proposed to fabricate ordered metal nanostructures uniformly on 4-inch soft and hard substrates without the aid of expensive instruments. Different nanostructure (gratings, nanoholes and nanoparticles) and different materials (metal and MoS<sub>2</sub>) were patterned, which shows wide application of double-layer self-priming nanoimprint technology. Moreover, by a double-layer system, the width and the height of metal can be adjusted through the photoresist thickness and developing condition, which provide a programmable way to fabricate different nanostructures using a single mold. The double-layer self-priming nanoimprint method can be applied in poor condition without equipment and be programmable in nanostructure parameters using a single mold, which reduces the cost of instruments and molds.https://www.mdpi.com/2072-666X/12/2/121double-layernanoimprintwafer-scalenanostructure |
| spellingShingle | Yue Su Zhaoxin Geng Weihao Fang Xiaoqing Lv Shicai Wang Zhengtai Ma Weihua Pei Route to Cost-Effective Fabrication of Wafer-Scale Nanostructure through Self-Priming Nanoimprint Micromachines double-layer nanoimprint wafer-scale nanostructure |
| title | Route to Cost-Effective Fabrication of Wafer-Scale Nanostructure through Self-Priming Nanoimprint |
| title_full | Route to Cost-Effective Fabrication of Wafer-Scale Nanostructure through Self-Priming Nanoimprint |
| title_fullStr | Route to Cost-Effective Fabrication of Wafer-Scale Nanostructure through Self-Priming Nanoimprint |
| title_full_unstemmed | Route to Cost-Effective Fabrication of Wafer-Scale Nanostructure through Self-Priming Nanoimprint |
| title_short | Route to Cost-Effective Fabrication of Wafer-Scale Nanostructure through Self-Priming Nanoimprint |
| title_sort | route to cost effective fabrication of wafer scale nanostructure through self priming nanoimprint |
| topic | double-layer nanoimprint wafer-scale nanostructure |
| url | https://www.mdpi.com/2072-666X/12/2/121 |
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