Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)

Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)

This paper presents the plasma-enhanced atomic layer deposition (PEALD) of titanium nitride (TiN) using the organic precursor tetrakis(ethylmethylamido)titanium (TEMAT), with remote ammonia (NH3) plasma as reactant gas. This work investigates the impact of substrate temperature, from 150-350°C, and...

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Bibliographic Details
Main Authors:	Chen Z.X., Li X., Li W.-M., Lo G.-Q.
Format:	Article
Language:	English
Published:	EDP Sciences 2016-01-01
Series:	MATEC Web of Conferences
Online Access:	http://dx.doi.org/10.1051/matecconf/20163901010

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