The Role of Annealing on Properties of Silicon Films Deposited By EB-PVD

The structural and optical properties of polycrystalline silicon films obtained on a silicon wafer by electron beam physical vapor deposition (EBPVD), were studied in this paper. These films were initially amorphous and changed to a crystalline solid phase during annealing. Annealing was performed i...

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Bibliographic Details
Main Authors: M. Zarchi, Sh. Ahangarani
Format: Article
Language:fas
Published: Isfahan University of Technology 2020-05-01
Series:Journal of Advanced Materials in Engineering
Subjects:
Online Access:http://jame.iut.ac.ir/article-1-904-en.html
Description
Summary:The structural and optical properties of polycrystalline silicon films obtained on a silicon wafer by electron beam physical vapor deposition (EBPVD), were studied in this paper. These films were initially amorphous and changed to a crystalline solid phase during annealing. Annealing was performed in an inert gas atmosphere tube furnace at different temperatures. Micro-structure of the films was analyzed to know the relationship between the crystalline / amorphous composition, grain size and characteristics of the films. The results showed a decrease in roughness with increasing annealing temperature and structural density. Moreover, results of Micro-Raman spectrum showed formation and increase of silicon nanocrystals in the annealed condition when the thickness of the coating increased due to structural defects.
ISSN:2251-600X
2423-5733