Nano-Crystallization of High-Entropy Amorphous NbTiAlSiWxNy Films Prepared by Magnetron Sputtering
High-entropy amorphous NbTiAlSiWxNy films (x = 0 or 1, i.e., NbTiAlSiNy and NbTiAlSiWNy) were prepared by magnetron sputtering method in the atmosphere of a mixture of N2 + Ar (N2 + Ar = 24 standard cubic centimeter per minute (sccm)), where N2 = 0, 4, and 8 sccm). All the as-deposited films present...
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MDPI AG
2016-06-01
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| Series: | Entropy |
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| Online Access: | http://www.mdpi.com/1099-4300/18/6/226 |
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| author | Wenjie Sheng Xiao Yang Cong Wang Yong Zhang |
| author_facet | Wenjie Sheng Xiao Yang Cong Wang Yong Zhang |
| author_sort | Wenjie Sheng |
| collection | DOAJ |
| description | High-entropy amorphous NbTiAlSiWxNy films (x = 0 or 1, i.e., NbTiAlSiNy and NbTiAlSiWNy) were prepared by magnetron sputtering method in the atmosphere of a mixture of N2 + Ar (N2 + Ar = 24 standard cubic centimeter per minute (sccm)), where N2 = 0, 4, and 8 sccm). All the as-deposited films present amorphous structures, which remain stable at 700 °C for over 24 h. After heat treatment at 1000 °C the films began to crystalize, and while the NbTiAlSiNy films (N2 = 4, 8 sccm) exhibit a face-centered cubic (FCC) structure, the NbTiAlSiW metallic films show a body-centered cubic (BCC) structure and then transit into a FCC structure composed of nanoscaled particles with increasing nitrogen flow rate. The hardness and modulus of the as-deposited NbTiAlSiNy films reach maximum values of 20.5 GPa and 206.8 GPa, respectively. For the as-deposited NbTiAlSiWNy films, both modulus and hardness increased to maximum values of 13.6 GPa and 154.4 GPa, respectively, and then decrease as the N2 flow rate is increased. Both films could be potential candidates for protective coatings at high temperature. |
| first_indexed | 2024-04-11T22:04:55Z |
| format | Article |
| id | doaj.art-2eed3732e13c4444b2f5d3fa5a26b3e9 |
| institution | Directory Open Access Journal |
| issn | 1099-4300 |
| language | English |
| last_indexed | 2024-04-11T22:04:55Z |
| publishDate | 2016-06-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Entropy |
| spelling | doaj.art-2eed3732e13c4444b2f5d3fa5a26b3e92022-12-22T04:00:46ZengMDPI AGEntropy1099-43002016-06-0118622610.3390/e18060226e18060226Nano-Crystallization of High-Entropy Amorphous NbTiAlSiWxNy Films Prepared by Magnetron SputteringWenjie Sheng0Xiao Yang1Cong Wang2Yong Zhang3State Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, Xueyuan Road 30#, Beijing 100083, ChinaState Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, Xueyuan Road 30#, Beijing 100083, ChinaCenter for Condensed Matter and Materials Physics, Department of Physics, Beihang University, Beijing 100191, ChinaState Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, Xueyuan Road 30#, Beijing 100083, ChinaHigh-entropy amorphous NbTiAlSiWxNy films (x = 0 or 1, i.e., NbTiAlSiNy and NbTiAlSiWNy) were prepared by magnetron sputtering method in the atmosphere of a mixture of N2 + Ar (N2 + Ar = 24 standard cubic centimeter per minute (sccm)), where N2 = 0, 4, and 8 sccm). All the as-deposited films present amorphous structures, which remain stable at 700 °C for over 24 h. After heat treatment at 1000 °C the films began to crystalize, and while the NbTiAlSiNy films (N2 = 4, 8 sccm) exhibit a face-centered cubic (FCC) structure, the NbTiAlSiW metallic films show a body-centered cubic (BCC) structure and then transit into a FCC structure composed of nanoscaled particles with increasing nitrogen flow rate. The hardness and modulus of the as-deposited NbTiAlSiNy films reach maximum values of 20.5 GPa and 206.8 GPa, respectively. For the as-deposited NbTiAlSiWNy films, both modulus and hardness increased to maximum values of 13.6 GPa and 154.4 GPa, respectively, and then decrease as the N2 flow rate is increased. Both films could be potential candidates for protective coatings at high temperature.http://www.mdpi.com/1099-4300/18/6/226high-entropy filmsputteringnano-scaled particlesphase stability |
| spellingShingle | Wenjie Sheng Xiao Yang Cong Wang Yong Zhang Nano-Crystallization of High-Entropy Amorphous NbTiAlSiWxNy Films Prepared by Magnetron Sputtering Entropy high-entropy film sputtering nano-scaled particles phase stability |
| title | Nano-Crystallization of High-Entropy Amorphous NbTiAlSiWxNy Films Prepared by Magnetron Sputtering |
| title_full | Nano-Crystallization of High-Entropy Amorphous NbTiAlSiWxNy Films Prepared by Magnetron Sputtering |
| title_fullStr | Nano-Crystallization of High-Entropy Amorphous NbTiAlSiWxNy Films Prepared by Magnetron Sputtering |
| title_full_unstemmed | Nano-Crystallization of High-Entropy Amorphous NbTiAlSiWxNy Films Prepared by Magnetron Sputtering |
| title_short | Nano-Crystallization of High-Entropy Amorphous NbTiAlSiWxNy Films Prepared by Magnetron Sputtering |
| title_sort | nano crystallization of high entropy amorphous nbtialsiwxny films prepared by magnetron sputtering |
| topic | high-entropy film sputtering nano-scaled particles phase stability |
| url | http://www.mdpi.com/1099-4300/18/6/226 |
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