Effect of the Deposition Time on the Structural, 3D Vertical Growth, and Electrical Conductivity Properties of Electrodeposited Anatase–Rutile Nanostructured Thin Films
TiO<sub>2</sub> time-dependent electrodeposited thin films were synthesized using an electrophoretic apparatus. The XRD analysis revealed that the films could exhibit a crystalline structure composed of ~81% anatase and ~6% rutile after 10 s of deposition, with crystallite size of 15 nm....
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| Format: | Article |
| Language: | English |
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MDPI AG
2022-08-01
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| Series: | Micromachines |
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| Online Access: | https://www.mdpi.com/2072-666X/13/8/1361 |
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| author | Moisés do Amaral Amâncio Yonny Romaguera-Barcelay Robert Saraiva Matos Marcelo Amanajás Pires Ariamna María Dip Gandarilla Marcus Valério Botelho do Nascimento Francisco Xavier Nobre Ştefan Ţălu Henrique Duarte da Fonseca Filho Walter Ricardo Brito |
| author_facet | Moisés do Amaral Amâncio Yonny Romaguera-Barcelay Robert Saraiva Matos Marcelo Amanajás Pires Ariamna María Dip Gandarilla Marcus Valério Botelho do Nascimento Francisco Xavier Nobre Ştefan Ţălu Henrique Duarte da Fonseca Filho Walter Ricardo Brito |
| author_sort | Moisés do Amaral Amâncio |
| collection | DOAJ |
| description | TiO<sub>2</sub> time-dependent electrodeposited thin films were synthesized using an electrophoretic apparatus. The XRD analysis revealed that the films could exhibit a crystalline structure composed of ~81% anatase and ~6% rutile after 10 s of deposition, with crystallite size of 15 nm. AFM 3D maps showed that the surfaces obtained between 2 and 10 s of deposition exhibit strong topographical irregularities with long-range and short-range correlations being observed in different surface regions, a trend also observed by the Minkowski functionals. The height-based ISO, as well as specific surface microtexture parameters, showed an overall decrease from 2 to 10 s of deposition, showing a subtle decrease in the vertical growth of the films. The surfaces were also mapped to have low spatial dominant frequencies, which is associated with the similar roughness profile of the films, despite the overall difference in vertical growth observed. The electrical conductivity measurements showed that despite the decrease in topographical roughness, the films acquired a thickness capable of making them increasingly insulating from 2 to 10 s of deposition. Thus, our results prove that the deposition time used during the electrophoretic experiment consistently affects the films’ structure, morphology, and electrical conductivity. |
| first_indexed | 2024-03-09T12:54:39Z |
| format | Article |
| id | doaj.art-2f7cb7bce5334e7795a60d67aacfce12 |
| institution | Directory Open Access Journal |
| issn | 2072-666X |
| language | English |
| last_indexed | 2024-03-09T12:54:39Z |
| publishDate | 2022-08-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Micromachines |
| spelling | doaj.art-2f7cb7bce5334e7795a60d67aacfce122023-11-30T22:01:05ZengMDPI AGMicromachines2072-666X2022-08-01138136110.3390/mi13081361Effect of the Deposition Time on the Structural, 3D Vertical Growth, and Electrical Conductivity Properties of Electrodeposited Anatase–Rutile Nanostructured Thin FilmsMoisés do Amaral Amâncio0Yonny Romaguera-Barcelay1Robert Saraiva Matos2Marcelo Amanajás Pires3Ariamna María Dip Gandarilla4Marcus Valério Botelho do Nascimento5Francisco Xavier Nobre6Ştefan Ţălu7Henrique Duarte da Fonseca Filho8Walter Ricardo Brito9Department of Chemistry, Federal University of Amazonas-UFAM, Manaus 69067-005, AM, BrazilDepartment of Physics, Federal University of Amazonas-UFAM, Manaus 69067-005, AM, BrazilGraduate Program in Materials Science and Engineering, Federal University of Sergipe-UFS, São Cristóvão 49100-000, SE, BrazilBrazilian Center for Research in Physics—CBPF, Rio de Janeiro 22290-180, RJ, BrazilDepartment of Chemistry, Federal University of Amazonas-UFAM, Manaus 69067-005, AM, BrazilFederal Institute of Education, Science and Technology of Amazonas, Coari 69460-000, AM, BrazilFederal Institute of Education, Science and Technology of Amazonas, Coari 69460-000, AM, BrazilDirectorate of Research, Development and Innovation Management (DMCDI), Technical University of Cluj-Napoca, 15 Constantin Daicoviciu St., 400020 Cluj-Napoca, RomaniaLaboratory of Nanomaterials Synthesis and Nanoscopy, Department of Physics, Federal University of Amazonas, Manaus 69067-005, AM, BrazilDepartment of Chemistry, Federal University of Amazonas-UFAM, Manaus 69067-005, AM, BrazilTiO<sub>2</sub> time-dependent electrodeposited thin films were synthesized using an electrophoretic apparatus. The XRD analysis revealed that the films could exhibit a crystalline structure composed of ~81% anatase and ~6% rutile after 10 s of deposition, with crystallite size of 15 nm. AFM 3D maps showed that the surfaces obtained between 2 and 10 s of deposition exhibit strong topographical irregularities with long-range and short-range correlations being observed in different surface regions, a trend also observed by the Minkowski functionals. The height-based ISO, as well as specific surface microtexture parameters, showed an overall decrease from 2 to 10 s of deposition, showing a subtle decrease in the vertical growth of the films. The surfaces were also mapped to have low spatial dominant frequencies, which is associated with the similar roughness profile of the films, despite the overall difference in vertical growth observed. The electrical conductivity measurements showed that despite the decrease in topographical roughness, the films acquired a thickness capable of making them increasingly insulating from 2 to 10 s of deposition. Thus, our results prove that the deposition time used during the electrophoretic experiment consistently affects the films’ structure, morphology, and electrical conductivity.https://www.mdpi.com/2072-666X/13/8/1361electrodepositionITOmorphologythin filmsTiO<sub>2</sub> |
| spellingShingle | Moisés do Amaral Amâncio Yonny Romaguera-Barcelay Robert Saraiva Matos Marcelo Amanajás Pires Ariamna María Dip Gandarilla Marcus Valério Botelho do Nascimento Francisco Xavier Nobre Ştefan Ţălu Henrique Duarte da Fonseca Filho Walter Ricardo Brito Effect of the Deposition Time on the Structural, 3D Vertical Growth, and Electrical Conductivity Properties of Electrodeposited Anatase–Rutile Nanostructured Thin Films Micromachines electrodeposition ITO morphology thin films TiO<sub>2</sub> |
| title | Effect of the Deposition Time on the Structural, 3D Vertical Growth, and Electrical Conductivity Properties of Electrodeposited Anatase–Rutile Nanostructured Thin Films |
| title_full | Effect of the Deposition Time on the Structural, 3D Vertical Growth, and Electrical Conductivity Properties of Electrodeposited Anatase–Rutile Nanostructured Thin Films |
| title_fullStr | Effect of the Deposition Time on the Structural, 3D Vertical Growth, and Electrical Conductivity Properties of Electrodeposited Anatase–Rutile Nanostructured Thin Films |
| title_full_unstemmed | Effect of the Deposition Time on the Structural, 3D Vertical Growth, and Electrical Conductivity Properties of Electrodeposited Anatase–Rutile Nanostructured Thin Films |
| title_short | Effect of the Deposition Time on the Structural, 3D Vertical Growth, and Electrical Conductivity Properties of Electrodeposited Anatase–Rutile Nanostructured Thin Films |
| title_sort | effect of the deposition time on the structural 3d vertical growth and electrical conductivity properties of electrodeposited anatase rutile nanostructured thin films |
| topic | electrodeposition ITO morphology thin films TiO<sub>2</sub> |
| url | https://www.mdpi.com/2072-666X/13/8/1361 |
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