Mechanism of oxide film removal by KF-AlF3 and CsF-AlF3 mixed fluxes on Cu and Al base metals and their effect on wettability

Mechanism of oxide film removal by KF-AlF3 and CsF-AlF3 mixed fluxes on Cu and Al base metals and their effect on wettability

CsF-AlF3 was added in different mass percentages to KF-AlF3 flux, and CsF-AlF3/KF-AlF3 mixed fluxes with different components were prepared by ball milling. The melting curves of four kinds of fluxes were measured using differential scanning calorimetry (DSC). The properties of the fluxes were studi...

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Bibliographic Details
Main Authors: Yinkai Shi, Yunpeng Li, Liangliang Zhang, Fangfang Cai, Xinna Cao, Xiao Li, Shizhong Wei, Weimin Long, Hua Yu, Bo Sun, Sujuan Zhong, Yongtao Jiu, Yunfeng Chang
Format: Article
Language:English
Published: Elsevier 2022-11-01
Series:Journal of Advanced Joining Processes
Subjects:
Flux
Flow test
Wettability
Growth of IMCs
EBSD
Online Access:http://www.sciencedirect.com/science/article/pii/S2666330922000322

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